18435283. Semiconductor Device And Method For Manufacturing The Same simplified abstract (SEMICONDUCTOR ENERGY LABORATORY CO., LTD.)

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Semiconductor Device And Method For Manufacturing The Same

Organization Name

SEMICONDUCTOR ENERGY LABORATORY CO., LTD.

Inventor(s)

Hajime Kimura of Atsugi (JP)

Semiconductor Device And Method For Manufacturing The Same - A simplified explanation of the abstract

This abstract first appeared for US patent application 18435283 titled 'Semiconductor Device And Method For Manufacturing The Same

Simplified Explanation: The semiconductor device described in the patent application includes a pixel electrode and a transistor with specific layers and electrodes.

Key Features and Innovation:

  • Pixel electrode and transistor with distinct layers and electrodes.
  • First gate electrode, first insulating layer, semiconductor layer, second insulating layer, and second gate electrode.
  • Overlapping regions between the gate electrodes and the semiconductor layer with insulating layers in between.
  • Thinner second insulating layer in the region where the second gate electrode overlaps with the semiconductor layer.

Potential Applications: This technology can be applied in the development of advanced semiconductor devices for various electronic applications, including displays, sensors, and integrated circuits.

Problems Solved: The technology addresses the need for precise control and efficient operation of transistors in semiconductor devices, improving overall performance and reliability.

Benefits:

  • Enhanced functionality and performance of semiconductor devices.
  • Improved control and efficiency of transistors.
  • Potential for miniaturization and increased integration in electronic systems.

Commercial Applications: The technology can be utilized in the production of high-resolution displays, sensitive sensors for various industries, and compact integrated circuits for consumer electronics.

Prior Art: Readers can explore prior patents related to semiconductor device structures, transistor configurations, and pixel electrode designs to understand the evolution of this technology.

Frequently Updated Research: Stay informed about the latest advancements in semiconductor device technology, transistor optimization, and electrode materials to enhance the performance of electronic devices.

Questions about Semiconductor Devices: 1. What are the key components of a semiconductor device? 2. How does the thickness of insulating layers impact the performance of transistors in semiconductor devices?


Original Abstract Submitted

A semiconductor device includes a pixel electrode and a transistor which includes a first gate electrode, a first insulating layer over the first gate electrode, a semiconductor layer over the first insulating layer, a second insulating layer over the semiconductor layer, and a second gate electrode. The pixel electrode and the second gate electrode are provided over the second insulating layer. The first gate electrode has a region overlapping with the semiconductor layer with the first insulating layer provided therebetween. The second gate electrode has a region overlapping with the semiconductor layer with the second insulating layer provided therebetween. A first region is at least part of a region where the second gate electrode overlaps with the semiconductor layer. A second region is at least part of a region where the pixel electrode is provided. The second insulating layer is thinner in the first region than in the second region.