18434345. SEMICONDUCTOR PROCESS TECHNOLOGY ASSESSMENT simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
Contents
- 1 SEMICONDUCTOR PROCESS TECHNOLOGY ASSESSMENT
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 SEMICONDUCTOR PROCESS TECHNOLOGY ASSESSMENT - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Unanswered Questions
- 1.11 Original Abstract Submitted
SEMICONDUCTOR PROCESS TECHNOLOGY ASSESSMENT
Organization Name
Taiwan Semiconductor Manufacturing Company, Ltd.
Inventor(s)
Hung-Chih Ou of Kaohsiung City (TW)
Kuo-Fu Lee of Hsinchu County (TW)
Wen-Hao Chen of Hsinchu City (TW)
Keh-Jeng Chang of Hsinchu City (TW)
Hsiang-Ho Chang of Miaoli County (TW)
SEMICONDUCTOR PROCESS TECHNOLOGY ASSESSMENT - A simplified explanation of the abstract
This abstract first appeared for US patent application 18434345 titled 'SEMICONDUCTOR PROCESS TECHNOLOGY ASSESSMENT
Simplified Explanation
The abstract describes a method of process technology assessment for integrated circuits, involving modeling objects in resistance and capacitance domains and generating scaling factors for simulation.
- Defining scope of process technology assessment
- Modeling objects in resistance and capacitance domains
- Generating resistance and capacitance scaling factors
- Utilizing scaling factors for simulation
Potential Applications
This technology can be applied in the semiconductor industry for optimizing integrated circuit designs and improving overall performance.
Problems Solved
This technology helps in accurately assessing process technology for integrated circuits, leading to better design decisions and improved circuit performance.
Benefits
The method provides a systematic approach to process technology assessment, leading to more efficient and effective integrated circuit designs.
Potential Commercial Applications
The technology can be utilized by semiconductor companies, electronic design automation tool developers, and integrated circuit designers to enhance product performance and competitiveness in the market.
Possible Prior Art
One possible prior art could be the use of simulation tools for integrated circuit design optimization, but the specific method described in this patent application appears to offer a unique approach to process technology assessment.
Unanswered Questions
How does this method compare to traditional process technology assessment techniques in terms of accuracy and efficiency?
The article does not provide a direct comparison between this method and traditional techniques, leaving the reader to wonder about the relative advantages of this new approach.
Are there any limitations or constraints in the application of this technology to different types of integrated circuits or process technologies?
The article does not address any potential limitations or constraints that may arise when applying this technology to diverse integrated circuit designs or process technologies, leaving room for further exploration and analysis in this area.
Original Abstract Submitted
A method of process technology assessment is provided. The method includes: defining a scope of the process technology assessment, the scope comprising an original process technology and a first process technology; modeling a first object in an integrated circuit into a resistance domain and a capacitance domain; generating a first resistance scaling factor and a first capacitance scaling factor based on the modeling, the original process technology, and the first process technology; and utilizing, by an electronic design automation (EDA) tool, the first resistance scaling factor and the first capacitance scaling factor for simulation of the integrated circuit.
