18433899. SYSTEM AND METHOD FOR DIAGNOSING PLASMA CHAMBER simplified abstract (ASM IP Holding B.V.)
Contents
- 1 SYSTEM AND METHOD FOR DIAGNOSING PLASMA CHAMBER
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 SYSTEM AND METHOD FOR DIAGNOSING PLASMA CHAMBER - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Original Abstract Submitted
SYSTEM AND METHOD FOR DIAGNOSING PLASMA CHAMBER
Organization Name
Inventor(s)
Imran Ahmed Bhutta of Moorestown NJ (US)
SYSTEM AND METHOD FOR DIAGNOSING PLASMA CHAMBER - A simplified explanation of the abstract
This abstract first appeared for US patent application 18433899 titled 'SYSTEM AND METHOD FOR DIAGNOSING PLASMA CHAMBER
Simplified Explanation
The patent application describes a system for determining a characteristic of a plasma chamber used in semiconductor processing tools. The system includes an impedance matching network, a sensor, and a control circuit that compares current parameter values with reference values to determine the plasma chamber's characteristic.
- The system includes an impedance matching network, a sensor, and a control circuit.
- The control circuit stores reference values for a parameter related to semiconductor processing tools.
- The sensor provides a signal used to determine the current value of the parameter.
- The control circuit compares the current parameter value with the reference values to determine the plasma chamber's characteristic.
Potential Applications
This technology could be applied in semiconductor manufacturing facilities to optimize plasma chamber performance and ensure consistent processing results.
Problems Solved
This technology helps in accurately determining the characteristics of a plasma chamber, which is crucial for maintaining the quality and efficiency of semiconductor processing.
Benefits
- Improved performance of semiconductor processing tools - Enhanced quality control in semiconductor manufacturing - Increased efficiency and productivity in plasma chamber operations
Potential Commercial Applications
"Optimizing Plasma Chamber Performance in Semiconductor Manufacturing"
Possible Prior Art
There may be prior art related to impedance matching networks and sensors used in plasma chambers for semiconductor processing tools.
Unanswered Questions
How does this system handle variations in parameter values over time?
The system may have a mechanism to account for drift or changes in parameter values to ensure accurate determination of the plasma chamber's characteristic.
Can this system be integrated with existing semiconductor processing tools easily?
It would be important to know if this system can be seamlessly integrated into current semiconductor manufacturing processes without significant modifications or disruptions.
Original Abstract Submitted
In one embodiment, a system for determining a characteristic of the plasma chamber is disclosed. The system includes an impedance matching network, a sensor, and a control circuit. The control circuit stores one or more reference values for a parameter related to a semiconductor processing tool. A current value for the parameter is determined based on a signal received from the sensor. The control circuit then determines a characteristic of the plasma chamber based on a comparison of the current value for the parameter and the one or more reference values for the parameter.
