18425048. DEPOSITION SYSTEM AND PROCESSING SYSTEM simplified abstract (Samsung Electronics Co., Ltd.)
Contents
DEPOSITION SYSTEM AND PROCESSING SYSTEM
Organization Name
Inventor(s)
Dongkwan Baek of Anyang-si (KR)
Hyungsuk Jung of Suwon-si (KR)
DEPOSITION SYSTEM AND PROCESSING SYSTEM - A simplified explanation of the abstract
This abstract first appeared for US patent application 18425048 titled 'DEPOSITION SYSTEM AND PROCESSING SYSTEM
The abstract describes a deposition system that includes a reaction chamber, a first gas supply unit, a reactant supply unit, and an exhaust unit. The first gas supply unit supplies a first precursor in a liquid state to the reaction chamber in a gaseous state. The exhaust unit discharges an exhaust material.
- The first gas supply unit includes a first sub tank, a first liquid mass flow controller, and a first vaporizer.
- A first automatic refill system periodically fills the first sub tank with the liquid first precursor stored in the first main tank.
- The exhaust unit comprises a processing chamber, a pump, and a scrubber to which a plasma pretreatment system is applied.
Potential Applications: - Thin film deposition in semiconductor manufacturing - Coating processes in the automotive industry - Solar cell production
Problems Solved: - Efficient delivery of precursor materials in gaseous form - Effective removal of exhaust materials
Benefits: - Improved deposition process control - Enhanced product quality - Reduced environmental impact
Commercial Applications: Title: Advanced Deposition System for Precision Manufacturing This technology can be used in industries such as semiconductor manufacturing, automotive, and renewable energy for precise and controlled deposition processes, leading to higher quality products and increased efficiency.
Prior Art: Readers can explore prior art related to deposition systems, gas supply units, and exhaust treatment systems in semiconductor manufacturing and other relevant industries.
Frequently Updated Research: Researchers are constantly working on improving deposition processes, gas supply systems, and exhaust treatment technologies to enhance manufacturing efficiency and product quality.
Questions about Deposition Systems: 1. How does the first gas supply unit ensure the precise delivery of the first precursor in gaseous form? 2. What are the key components of the exhaust unit and how do they contribute to the efficient removal of exhaust materials?
Original Abstract Submitted
A deposition system, includes: a reaction chamber; a first gas supply unit supplying a first precursor in a liquid state stored in a first main tank to the reaction chamber in a gaseous state; a reactant supply unit supplying a reactant to the reaction chamber; and an exhaust unit discharging an exhaust material, wherein the first gas supply unit includes a first sub tank, a first liquid mass flow controller, and a first vaporizer, the first precursor is supplied to the reaction chamber by passing through the first sub tank, the first liquid mass flow controller, and the first vaporizer, a first automatic refill system operates to periodically fill the first sub tank with the liquid first precursor stored in the first main tank, and the exhaust unit comprises a processing chamber, a pump, and a scrubber to which a plasma pretreatment system is applied.
