18422903. PROCESSING LIQUID DISCHARGE DEVICE simplified abstract (BROTHER KOGYO KABUSHIKI KAISHA)

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PROCESSING LIQUID DISCHARGE DEVICE

Organization Name

BROTHER KOGYO KABUSHIKI KAISHA

Inventor(s)

Shunsuke Okai of Nagoya (JP)

Yutaka Takagiwa of Kariya (JP)

PROCESSING LIQUID DISCHARGE DEVICE - A simplified explanation of the abstract

This abstract first appeared for US patent application 18422903 titled 'PROCESSING LIQUID DISCHARGE DEVICE

Simplified Explanation: The patent application describes a processing liquid discharge device that includes an accommodation unit, a spray nozzle, a supply flow path, a pump, a valve, a circulation flow path, and a controller.

  • The device is designed to accommodate processing liquid and spray it using a spray nozzle.
  • A pump is used to supply the processing liquid from the accommodation unit to the spray nozzle.
  • A valve in the supply flow path controls the flow of the processing liquid.
  • The circulation flow path allows the processing liquid to flow back to the accommodation unit.
  • The controller manages the valve to control the flow of the processing liquid.

Key Features and Innovation:

  • Accommodation unit for processing liquid
  • Spray nozzle for discharge
  • Pump for liquid supply
  • Valve for flow control
  • Circulation flow path for liquid return
  • Controller for managing flow

Potential Applications: The device can be used in industrial processes, cleaning applications, agricultural spraying, and other liquid discharge operations.

Problems Solved: The device solves the problem of efficiently controlling the flow of processing liquid and allowing for circulation back to the source.

Benefits:

  • Efficient liquid discharge
  • Controlled flow management
  • Circulation for reusing liquid
  • Versatile applications in various industries

Commercial Applications: The device can be used in manufacturing plants, cleaning services, agricultural operations, and other industries requiring controlled liquid discharge systems.

Prior Art: Readers can explore prior patents related to liquid discharge devices, flow control systems, and circulation mechanisms to understand the background of this technology.

Frequently Updated Research: Stay updated on advancements in liquid discharge technology, flow control innovations, and sustainable liquid management practices.

Questions about Liquid Discharge Devices: 1. What are the key components of a liquid discharge device? 2. How does the circulation flow path contribute to the efficiency of the device?


Original Abstract Submitted

A processing liquid discharge device includes: an accommodation unit configured to accommodate a processing liquid; a spray nozzle; a supply flow path for supplying the processing liquid from the accommodation unit to the spray nozzle; a pump; a valve provided in the supply flow path between the spray nozzle and the pump; a circulation flow path including one end being connected to the supply flow path between the valve and the pump, or to the valve, and the other end being connected to the supply flow path between the pump and the accommodation unit, or to the accommodation unit; and a controller that controls the valve to be set in a communication state after activating the pump to cause the processing liquid to flow from the supply flow path to the circulation flow path while controlling the valve to be set in a cut-off state.