18420184. APPARATUS AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
Contents
APPARATUS AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
Organization Name
Taiwan Semiconductor Manufacturing Company, Ltd.
Inventor(s)
Tsung-Cheng Wu of Hsinchu (TW)
Ming-Hsien Lin of Taichung City (TW)
APPARATUS AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE - A simplified explanation of the abstract
This abstract first appeared for US patent application 18420184 titled 'APPARATUS AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
Simplified Explanation: In a semiconductor etching or deposition process, a controller adjusts the positions of a cover ring and a shield over a wafer in a vacuum chamber to reduce alarms.
- The controller determines an offset in relative positions of the cover ring and shield.
- It provides a position alarm or adjusts the position of the cover ring or shield when the offset exceeds a predetermined value or falls outside an acceptable range.
Key Features and Innovation:
- Controller adjusts positions of cover ring and shield in semiconductor processes.
- Reduces occurrence of alarms in the etching or deposition process.
- Monitors and corrects offset in relative positions of components.
- Enhances efficiency and reliability of semiconductor manufacturing.
Potential Applications: This technology can be applied in various semiconductor manufacturing processes where precise positioning of components is crucial for optimal performance and quality control.
Problems Solved:
- Reduces the occurrence of alarms in semiconductor etching or deposition processes.
- Improves the accuracy and consistency of component positioning.
- Enhances overall efficiency and productivity in semiconductor manufacturing.
Benefits:
- Minimizes disruptions and downtime caused by alarms.
- Improves the quality and yield of semiconductor products.
- Enhances process control and reliability.
- Optimizes resource utilization in manufacturing operations.
Commercial Applications: The technology can be utilized in semiconductor fabrication facilities to streamline production processes, improve product quality, and reduce operational costs. It has implications for the semiconductor industry's competitiveness and market position.
Questions about Semiconductor Etching or Deposition Processes: 1. How does the controller determine the offset in relative positions of the cover ring and shield? 2. What are the specific benefits of reducing alarms in semiconductor manufacturing processes?
Original Abstract Submitted
To reduce the occurrence of current alarms in a semiconductor etching or deposition process, a controller determines an offset in relative positions of a cover ring and a shield over a wafer within a vacuum chamber. The controller provides a position alarm and/or adjusts the position of the cover ring or shield when the offset is greater than a predetermined value or outside a range of acceptable values.
