18419021. GAS SUPPLY SYSTEM simplified abstract (Samsung Electronics Co., Ltd.)
Contents
GAS SUPPLY SYSTEM
Organization Name
Inventor(s)
Hyungwoo Choi of Suwon-si (KR)
GAS SUPPLY SYSTEM - A simplified explanation of the abstract
This abstract first appeared for US patent application 18419021 titled 'GAS SUPPLY SYSTEM
The gas supply system described in the patent application includes various components such as a manifold, cleaning gas supply line, inert gas supply lines, opening/closing valves, reaction gas supply line, source gas supply line with a vaporizer, and a controller.
- The system is designed to supply gases for processing substrates in a process chamber efficiently.
- A cleaning gas supply line is used to supply a cleaning gas to the manifold.
- A first inert gas supply line supplies a first inert gas to the cleaning gas supply line.
- A second inert gas supply line supplies a second inert gas to the manifold, branching out to a carrier gas supply line and a curtain gas supply line.
- A second opening/closing valve selectively controls the flow of gases in the carrier gas supply line and the curtain gas supply line.
Potential Applications: - Semiconductor manufacturing processes - Thin film deposition processes - Solar cell production - LED manufacturing
Problems Solved: - Efficient and precise control of gas flow in a gas supply system - Preventing contamination during substrate processing - Enhancing the quality and uniformity of thin films
Benefits: - Improved process efficiency - Enhanced product quality - Reduced downtime for maintenance and cleaning
Commercial Applications: Title: Gas Supply System for Semiconductor Manufacturing This technology can be utilized in semiconductor manufacturing facilities to improve process control and product quality. The market implications include increased production efficiency and higher yields for semiconductor manufacturers.
Questions about Gas Supply Systems: 1. How does the gas supply system ensure precise control of gas flow? The system uses opening/closing valves and inert gas supply lines to regulate the flow of different gases accurately.
2. What are the potential applications of this gas supply system beyond semiconductor manufacturing? The system can also be used in industries such as solar cell production, LED manufacturing, and thin film deposition processes.
Original Abstract Submitted
A gas supply system includes a manifold for supplying gases for processing the substrate to a process chamber; a cleaning gas supply line supplying a cleaning gas to the manifold; a first inert gas supply line supplying a first inert gas to the cleaning gas supply line; a first opening/closing valve opening and closing the cleaning gas supply line; a reaction gas supply line supplying a reaction gas to the manifold; a source gas supply line provided with a vaporizer and supplying the source gas to the manifold; a second inert gas supply line supplying a second inert gas to the manifold and branching out to a carrier gas supply line connected to the vaporizer and a curtain gas supply line bypassing the vaporizer; a second opening/closing valve selectively opening or closing the carrier gas supply line and the curtain gas supply line; and a controller.
