18412997. CYCLOSILAZANE PRECURSORS AND RELATED METHODS simplified abstract (ENTEGRIS, INC.)
Contents
CYCLOSILAZANE PRECURSORS AND RELATED METHODS
Organization Name
Inventor(s)
MinSeok Ryu of Namdong-gu (KR)
SeongCheol Kim of Suwon-si (KR)
CYCLOSILAZANE PRECURSORS AND RELATED METHODS - A simplified explanation of the abstract
This abstract first appeared for US patent application 18412997 titled 'CYCLOSILAZANE PRECURSORS AND RELATED METHODS
Simplified Explanation: The patent application describes a method for forming a silicon-containing film using a precursor composed of a cyclosilazane compound, which is obtained by reacting an aminosilane and a halosilane.
- A precursor is provided, consisting of a cyclosilazane compound formed from an aminosilane and a halosilane.
- The method involves obtaining the aminosilane and halosilane, then combining them to create the precursor.
- The precursor is used to form a silicon-containing film, offering a new approach to film deposition processes.
Potential Applications: 1. Semiconductor manufacturing 2. Thin film deposition in electronic devices 3. Coating applications in various industries
Problems Solved: 1. Simplifying the process of forming silicon-containing films 2. Enhancing the efficiency of film deposition methods 3. Improving the quality and properties of thin films
Benefits: 1. Increased control over film formation 2. Enhanced film uniformity and consistency 3. Potential cost savings in manufacturing processes
Commercial Applications: The technology could be utilized in the semiconductor industry for the production of advanced electronic devices, as well as in the manufacturing of coatings for various industrial applications.
Questions about Silicon-Containing Film Formation: 1. How does the precursor improve the efficiency of film deposition processes? 2. What are the potential cost-saving implications of using this technology in manufacturing?
Original Abstract Submitted
Precursors and related methods are provided. A precursor comprises a cyclosilazane compound. The cyclosilazane compound is a reaction product of an aminosilane and a halosilane. A method for forming the precursor comprises obtaining an aminosilane, obtaining a halosilane, and contacting the aminosilane and the halosilane to obtain the precursor. A method for forming a silicon-containing film using the precursor is also provided, among other embodiments.
