18411380. ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE simplified abstract (FUJIFILM Corporation)
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE
Organization Name
Inventor(s)
Akiyoshi Goto of Haibara-gun (JP)
Yohei Ishiji of Haibara-gun (JP)
Satomi Takahashi of Haibara-gun (JP)
Michihiro Shirakawa of Haibara-gun (JP)
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE - A simplified explanation of the abstract
This abstract first appeared for US patent application 18411380 titled 'ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE
Simplified Explanation: The patent application describes an actinic ray-sensitive or radiation-sensitive resin composition that maintains consistent line width in patterns even with varying waiting times before development treatment.
- The composition ensures minimal variation in line width post-exposure and pre-development.
- The invention includes a resist film and methods for pattern formation and electronic device production.
- The technology aims to improve the reliability and consistency of pattern formation processes in semiconductor manufacturing.
Key Features and Innovation:
- Consistent line width in patterns despite variations in waiting time before development treatment.
- Enhanced reliability and reproducibility in semiconductor manufacturing processes.
- Comprehensive solution including resin composition, resist film, and production methods.
Potential Applications: The technology can be applied in semiconductor manufacturing, photolithography, and other industries requiring precise pattern formation processes.
Problems Solved:
- Inconsistencies in line width due to variations in waiting time before development treatment.
- Lack of reliability and reproducibility in pattern formation processes.
Benefits:
- Improved quality control in semiconductor manufacturing.
- Enhanced efficiency and cost-effectiveness in pattern formation processes.
- Increased yield and reduced waste in electronic device production.
Commercial Applications: Title: Actinic Ray-Sensitive Resin Composition for Semiconductor Manufacturing The technology can be utilized in the semiconductor industry for improved pattern formation processes, leading to higher quality products and increased production efficiency.
Prior Art: Prior research in actinic ray-sensitive resin compositions and pattern formation methods in semiconductor manufacturing can provide valuable insights into the development of this technology.
Frequently Updated Research: Ongoing research in semiconductor manufacturing processes, photolithography techniques, and materials science may contribute to further advancements in actinic ray-sensitive resin compositions.
Questions about Actinic Ray-Sensitive Resin Composition: 1. How does the waiting time before development treatment affect the line width consistency in patterns? 2. What are the key differences between this resin composition and existing materials used in semiconductor manufacturing?
Original Abstract Submitted
An object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition that provides a pattern having little variation in the line width even if the time from the end of exposure treatment to the start of development treatment (waiting time before development) varies. Another object of the present invention is to provide a resist film, a pattern forming method, and a method for producing an electronic device that are related to the actinic ray-sensitive or radiation-sensitive resin composition.
