18398162. PLASMA PROCESSING SYSTEM AND EDGE RING REPLACEMENT METHOD simplified abstract (Tokyo Electron Limited)
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PLASMA PROCESSING SYSTEM AND EDGE RING REPLACEMENT METHOD
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PLASMA PROCESSING SYSTEM AND EDGE RING REPLACEMENT METHOD - A simplified explanation of the abstract
This abstract first appeared for US patent application 18398162 titled 'PLASMA PROCESSING SYSTEM AND EDGE RING REPLACEMENT METHOD
Simplified Explanation:
The patent application describes a plasma processing system that involves a series of steps to transfer components within the system.
Key Features and Innovation:
- Control device executes various movements to transfer components efficiently.
- Utilizes lifters, jigs, holders, and support surfaces to move components.
- Enables precise positioning and transfer of edge rings and substrates.
Potential Applications: This technology can be applied in semiconductor manufacturing, solar panel production, and other industries requiring precise plasma processing.
Problems Solved: Addresses the need for efficient and accurate transfer of components in plasma processing systems. Improves overall productivity and reduces the risk of damage to delicate components.
Benefits: Enhances the efficiency of plasma processing systems. Ensures accurate positioning of components for optimal processing results. Reduces the risk of damage to components during transfer.
Commercial Applications: Title: Advanced Plasma Processing System for Semiconductor Manufacturing This technology can be used in semiconductor fabrication facilities to improve the efficiency and accuracy of plasma processing, leading to higher quality semiconductor products and increased production capacity.
Prior Art: Readers can explore prior patents related to plasma processing systems, lifters, jigs, and holders to gain a deeper understanding of the technological advancements in this field.
Frequently Updated Research: Researchers are constantly exploring new methods and technologies to further enhance the efficiency and precision of plasma processing systems. Stay updated on the latest advancements in this field to leverage cutting-edge technologies for improved manufacturing processes.
Questions about Plasma Processing Systems: 1. What are the key components of a plasma processing system? 2. How does the use of lifters and jigs improve the efficiency of plasma processing systems?
Original Abstract Submitted
A plasma processing system includes a control device. The control device executes raising a lifter to deliver a cover ring supporting an edge ring to the lifter; moving a jig supported by a holder to a space between the cover ring and a substrate support surface/an annular support surface; raising a different lifter to deliver the jig to the different lifter; extracting the holder, and then moving the lifter and the different lifter relatively to deliver the edge ring to the jig; lowering only the lifter to deliver the cover ring to the annular member support surface; moving the holder to a space between the cover ring and the jig, and then lowering the different lifter to deliver the jig to the holder; and extracting the holder from the processing chamber to transfer the jig supporting the edge ring from the processing chamber.
