18396829. METHOD OF FORMING MOLYBDENUM SILICIDE simplified abstract (ASM IP Holding B.V.)
Contents
METHOD OF FORMING MOLYBDENUM SILICIDE
Organization Name
Inventor(s)
YoungChol Byun of Tempe AZ (US)
Petri Raisanen of Gilbert AZ (US)
Sang Ho Yu of Cupertino CA (US)
Sukanya Datta of Phoenix AZ (US)
Jan Willem Maes of Wilrijk (BE)
[[:Category:Elina F�rm of Helsinki (NL)|Elina F�rm of Helsinki (NL)]][[Category:Elina F�rm of Helsinki (NL)]]
METHOD OF FORMING MOLYBDENUM SILICIDE - A simplified explanation of the abstract
This abstract first appeared for US patent application 18396829 titled 'METHOD OF FORMING MOLYBDENUM SILICIDE
The abstract of this patent application describes methods of forming molybdenum silicide, including selectively forming it on a first surface relative to a second surface, and potentially incorporating a cleaning step before the formation process.
- Simplified Explanation:
This patent application discusses methods for creating molybdenum silicide, which involves selectively forming it on one surface over another and potentially cleaning the surfaces beforehand.
- Key Features and Innovation:
- Selective formation of molybdenum silicide on specific surfaces - Potential inclusion of a cleaning step prior to formation
- Potential Applications:
- Semiconductor manufacturing - Electronics industry - Solar cell production
- Problems Solved:
- Precise control over molybdenum silicide formation - Enhanced efficiency in semiconductor device fabrication
- Benefits:
- Improved performance of electronic components - Increased reliability of semiconductor devices - Cost-effective manufacturing processes
- Commercial Applications:
"Advanced Methods for Molybdenum Silicide Formation in Semiconductor Manufacturing: Market Implications and Potential Commercial Uses"
- Prior Art:
Readers can explore prior research on molybdenum silicide formation in semiconductor manufacturing processes to understand the evolution of this technology.
- Frequently Updated Research:
Stay informed about the latest advancements in molybdenum silicide formation techniques by following relevant research publications and industry developments.
Questions about Molybdenum Silicide: 1. What are the primary advantages of using molybdenum silicide in semiconductor manufacturing? 2. How does the selective formation process of molybdenum silicide contribute to improved device performance?
Original Abstract Submitted
Methods of forming molybdenum silicide are disclosed. Exemplary methods can include selectively forming molybdenum silicide on a first surface relative to a second surface. Additionally or alternatively, exemplary methods can include a cleaning step prior to forming the molybdenum silicide.
