18396718. HIGH-FREQUENCY POWER SUPPLY SYSTEM simplified abstract (DAIHEN Corporation)
Contents
HIGH-FREQUENCY POWER SUPPLY SYSTEM
Organization Name
Inventor(s)
HIGH-FREQUENCY POWER SUPPLY SYSTEM - A simplified explanation of the abstract
This abstract first appeared for US patent application 18396718 titled 'HIGH-FREQUENCY POWER SUPPLY SYSTEM
Simplified Explanation:
The high-frequency power supply system described in the patent application consists of two power supplies and two matchers. One power supply performs pulse modulation, while the other performs frequency modulation and frequency offset control.
- The system includes a first power supply and a second power supply
- The second power supply performs pulse modulation by alternating between outputting a forward wave voltage and not outputting it
- The first power supply controls frequency modulation and frequency offset in different periods of the second power supply's operation
Key Features and Innovation:
- Dual power supplies for pulse and frequency modulation
- Frequency offset control for precise voltage output
- Efficient power supply system design
Potential Applications:
- High-frequency electronics
- Power supply systems
- Industrial automation
Problems Solved:
- Precise voltage control in high-frequency systems
- Efficient power modulation techniques
Benefits:
- Improved voltage control accuracy
- Enhanced power supply efficiency
- Increased performance in high-frequency applications
Commercial Applications:
The technology could be used in various industries such as telecommunications, medical devices, and manufacturing for high-frequency power supply needs.
Questions about high-frequency power supply systems:
1. How does the frequency modulation control in the first power supply impact the overall system performance? 2. What are the potential challenges in implementing frequency offset control in power supply systems?
Original Abstract Submitted
A high-frequency power supply system according to the present disclosure includes a first power supply, a second power supply, a first matcher, and a second matcher. The second power supply performs pulse modulation of repeating an ON operation of outputting a second forward wave voltage and an OFF operation of not outputting the second forward wave voltage. The first power supply performs frequency modulation control in a second power supply ON period, and performs frequency offset control of outputting a forward wave voltage having a fundamental frequency obtained by adding an offset frequency to a fundamental frequency in a second power supply OFF period.
