18395006. PROCESS CHAMBER VOLUME ADJUSTMENT simplified abstract (ASM IP Holding B.V.)
Contents
PROCESS CHAMBER VOLUME ADJUSTMENT
Organization Name
Inventor(s)
Christopher Falcone of Chandler AZ (US)
Dinkar Nandwana of Chandler AZ (US)
Kyle Fondurulia of Phoenix AZ (US)
Vishnu Shakti of Bangalore (IN)
PROCESS CHAMBER VOLUME ADJUSTMENT - A simplified explanation of the abstract
This abstract first appeared for US patent application 18395006 titled 'PROCESS CHAMBER VOLUME ADJUSTMENT
Simplified Explanation: The patent application describes methods and apparatuses for adjusting the volume of a process chamber, which can lead to reduced precursor gases and processing time for coating workpieces.
- After removing a component from the process chamber, a fixture is installed to adjust the chamber's volume.
- This adjustment can result in faster and more efficient coating of workpieces.
- Coated workpieces can then be transferred to another process chamber for further processing.
Key Features and Innovation:
- Adjustment of process chamber volume with a fixture.
- Reduction in precursor gases and processing time.
- Improved efficiency in coating workpieces.
Potential Applications: The technology can be applied in various industries such as semiconductor manufacturing, aerospace, automotive, and medical devices.
Problems Solved: The technology addresses the need for faster and more efficient coating processes, as well as the reduction of precursor gases used in the process.
Benefits:
- Reduced processing time.
- Lower consumption of precursor gases.
- Improved overall efficiency in coating processes.
Commercial Applications: The technology can be used in industries where coating processes are essential, such as semiconductor manufacturing, automotive, and medical devices. It can lead to cost savings and improved productivity.
Prior Art: Readers can start their search for prior art related to this technology by looking into patents and publications in the field of process chamber volume adjustment and coating processes.
Frequently Updated Research: Researchers are constantly exploring new ways to optimize process chamber volumes and coating processes for various applications.
Questions about Process Chamber Volume Adjustment: 1. How does adjusting the volume of a process chamber impact coating efficiency? 2. What are the potential cost savings associated with reducing precursor gases in coating processes?
Original Abstract Submitted
Methods and apparatuses for adjusting a process chamber volume are described. For example, a process chamber, after removing at least a component used to perform a function associated with the process chamber, may be installed with a fixture to adjust a volume of the process chamber. The process chamber with the fixture may reduce the amount of precursor gases and processing time for coating a workpiece. The workpiece, after the coating, may be placed in another process chamber to perform a function associated with the other process chamber.
