18389138. DEPOSITION APPARATUS INCLUDING MASK ASSEMBLY AND SHAPE CORRECTION METHOD FOR MASK ASSEMBLY simplified abstract (SAMSUNG DISPLAY CO., LTD.)
Contents
DEPOSITION APPARATUS INCLUDING MASK ASSEMBLY AND SHAPE CORRECTION METHOD FOR MASK ASSEMBLY
Organization Name
Inventor(s)
WONYOUNG Jang of Yongin-si (KR)
SEUNGJU Hong of Yongin-si (KR)
DEPOSITION APPARATUS INCLUDING MASK ASSEMBLY AND SHAPE CORRECTION METHOD FOR MASK ASSEMBLY - A simplified explanation of the abstract
This abstract first appeared for US patent application 18389138 titled 'DEPOSITION APPARATUS INCLUDING MASK ASSEMBLY AND SHAPE CORRECTION METHOD FOR MASK ASSEMBLY
The patent application describes a deposition apparatus that includes a chamber, a stage with a stage-opening, a frame with a frame-opening corresponding to the stage-opening, a mask with deposition openings, a deposition source, alignment units, and correction units.
- The apparatus consists of a chamber, stage, frame, mask, deposition source, alignment units, and correction units.
- The mask is coupled to the frame and has deposition openings aligned with the frame-opening.
- The deposition source sprays deposition material through the frame-opening.
- Alignment units on the stage move the frame to adjust its position.
- Correction units, with magnetic force parts and driving parts, change the shape of the frame.
- The correction units are coupled to the stage to modify the frame's position.
Potential Applications:
- Semiconductor manufacturing
- Thin film deposition processes
- Optical coating applications
Problems Solved:
- Precise control of deposition material
- Alignment and positioning accuracy
- Shape correction during deposition processes
Benefits:
- Improved deposition accuracy
- Enhanced control over thin film coatings
- Increased efficiency in semiconductor fabrication
Commercial Applications:
- Advanced semiconductor fabrication equipment
- High-precision optical coating systems
- Thin film deposition machinery for research and development labs
Prior Art: Prior art related to this technology may include patents or research papers on deposition apparatus with shape correction mechanisms, alignment units, and precise deposition control systems.
Frequently Updated Research: Research on magnetic force applications in deposition processes Research on shape correction mechanisms in thin film deposition
Questions about Deposition Apparatus: 1. How does the magnetic force part in the correction units contribute to changing the shape of the frame? 2. What are the potential challenges in integrating alignment units and correction units in a deposition apparatus?
Original Abstract Submitted
A deposition apparatus includes: a chamber; a stage defining a stage-opening therein and disposed inside the chamber; a frame disposed on the stage and defining a frame-opening therein corresponding to the stage-opening; a mask coupled to the frame and defining a plurality of deposition openings therein corresponding to the frame-opening; a deposition source configured to spray a deposition material to the frame-opening; alignment units coupled to the stage and contacting the frame to move a position of the frame on the stage; and correction units each of which includes a magnetic force part disposed on the stage and adjacent to the frame, and a driving part configured to provide a magnetic force to the magnetic force part, wherein the correction units are configured to change a shape of the frame, and are coupled to the stage.
