18371663. SEMICONDUCTOR DEVICES HAVING BIT LINES simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)

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SEMICONDUCTOR DEVICES HAVING BIT LINES

Organization Name

SAMSUNG ELECTRONICS CO., LTD.

Inventor(s)

Jongmin Kim of Suwon-si (KR)

Chansic Yoon of Suwon-si (KR)

Junhyeok Ahn of Suwon-si (KR)

SEMICONDUCTOR DEVICES HAVING BIT LINES - A simplified explanation of the abstract

This abstract first appeared for US patent application 18371663 titled 'SEMICONDUCTOR DEVICES HAVING BIT LINES

The semiconductor device described in the patent application includes a gate electrode in a cell region of a substrate, along with bit line structure pairs and extension portion pairs in an interface region of the substrate.

  • The bit line structure pairs consist of a first bit line structure and a second bit line structure, spaced apart by a certain distance.
  • The extension portion pairs include a first extension portion and a second extension portion, connected to the first and second bit line structures respectively, and spaced closer together than the bit line structures.

Potential Applications: - This technology could be used in the development of advanced semiconductor devices for various electronic applications. - It may find applications in memory devices, logic circuits, and other semiconductor-based systems.

Problems Solved: - The design addresses the need for efficient and compact semiconductor devices with improved performance. - It solves the challenge of optimizing the layout of bit line structures and extension portions within the substrate.

Benefits: - Enhanced functionality and performance of semiconductor devices. - Improved integration and miniaturization of components. - Potential cost savings in manufacturing processes.

Commercial Applications: Title: Advanced Semiconductor Device Technology for Enhanced Performance This technology could be utilized in the production of high-performance electronic devices, leading to improved market competitiveness and consumer satisfaction.

Prior Art: Information on prior art related to this specific semiconductor device design is not provided in the abstract.

Frequently Updated Research: There is no information on frequently updated research relevant to this technology in the abstract.

Questions about Semiconductor Device Technology: 1. How does the spacing between the bit line structures and extension portions impact the performance of the semiconductor device? 2. What are the potential challenges in scaling up this technology for mass production?


Original Abstract Submitted

A semiconductor device includes a gate electrode disposed within a cell region of a substrate, each of bit line structure pairs including a first bit line structure and a second bit line structure, and extension portion pairs disposed within an interface region of the substrate, each extension portion pair including a first extension portion and a second extension portion that are connected to the first bit line structure and the second bit line structure, respectively. The bit line structure pairs are spaced apart from each other by a first distance. In each bit line structure pair, the first bit line structure and the second bit line structure are spaced apart from each other by the first distance. In each extension portion pair, the first extension portion and the second extension portion are spaced apart from each other at a second distance less than the first distance.