18367559. PROCESSING APPARATUS AND PROCESSING METHOD simplified abstract (Samsung Display Co., LTD.)
Contents
- 1 PROCESSING APPARATUS AND PROCESSING METHOD
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 PROCESSING APPARATUS AND PROCESSING METHOD - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Original Abstract Submitted
PROCESSING APPARATUS AND PROCESSING METHOD
Organization Name
Inventor(s)
JEONGJIN Park of Yongin-si (KR)
YONG-HOON Kwon of Yongin-si (KR)
BYUNGHOON Kim of Yongin-si (KR)
PROCESSING APPARATUS AND PROCESSING METHOD - A simplified explanation of the abstract
This abstract first appeared for US patent application 18367559 titled 'PROCESSING APPARATUS AND PROCESSING METHOD
Simplified Explanation
The processing apparatus described in the abstract includes a first processing unit that sprays a mixture into a first region of a processing target, and a second processing unit that irradiates a beam into the first region of the processing target while maintaining a predetermined temperature or higher to facilitate ion-exchange between the processing target and materials of the mixture.
- The first processing unit sprays a mixture into a specific region of the processing target.
- The second processing unit irradiates a beam into the same region of the processing target.
- The apparatus maintains the temperature of the region to a predetermined level or higher to enable ion-exchange between the processing target and materials of the mixture.
Potential Applications
This technology could be applied in the manufacturing of semiconductor devices, specifically in processes involving ion-exchange.
Problems Solved
This technology solves the problem of achieving efficient ion-exchange between a processing target and materials of a mixture by controlling the temperature of the processing region.
Benefits
The benefits of this technology include improved efficiency in ion-exchange processes, leading to enhanced performance and quality of semiconductor devices.
Potential Commercial Applications
One potential commercial application of this technology could be in the semiconductor industry for the production of high-performance electronic components.
Possible Prior Art
Prior art in the field of semiconductor manufacturing processes may include similar methods of controlling temperature during ion-exchange processes, but the specific combination of spraying a mixture and irradiating a beam into the processing target may be novel.
Unanswered Questions
How does this technology compare to existing methods of ion-exchange in semiconductor manufacturing processes?
This article does not provide a direct comparison between this technology and existing methods in terms of efficiency, cost-effectiveness, or overall performance.
What are the specific materials used in the mixture for ion-exchange in this technology?
The article does not specify the exact materials used in the mixture for ion-exchange, leaving room for further exploration and research in this area.
Original Abstract Submitted
A processing apparatus includes a first processing unit to spray a mixture into a first region of a processing target, and a second processing unit to irradiate a beam into the first region of the processing target, and maintain a temperature of the first region to a predetermined temperature or more, in which the predetermined temperature is for ion-exchange between the processing target and some materials of the mixture.
