18360238. EXPOSURE APPARATUS, EXPOSURE METHOD AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
EXPOSURE APPARATUS, EXPOSURE METHOD AND ARTICLE MANUFACTURING METHOD
Organization Name
Inventor(s)
MAMORU Kaneishi of Tochigi (JP)
EXPOSURE APPARATUS, EXPOSURE METHOD AND ARTICLE MANUFACTURING METHOD - A simplified explanation of the abstract
This abstract first appeared for US patent application 18360238 titled 'EXPOSURE APPARATUS, EXPOSURE METHOD AND ARTICLE MANUFACTURING METHOD
Simplified Explanation
The exposure apparatus described in the patent application is designed to expose multiple shot regions on a substrate using a stage that holds and drives the substrate. The driving of the stage is controlled by a control unit based on a driving profile that includes a first acceleration profile for non-exposure sections and a second acceleration profile for exposure sections, with the second profile being a curve. The control unit determines the acceleration profiles for each shot region based on the size of the region.
- The apparatus is designed to expose multiple shot regions on a substrate.
- The stage holds and drives the substrate, while the control unit controls the driving based on a driving profile.
- The driving profile includes a first acceleration profile for non-exposure sections and a second acceleration profile for exposure sections, with the second profile being a curve.
- The control unit determines the acceleration profiles for each shot region based on the size of the region.
Potential Applications
- Semiconductor manufacturing
- Photolithography processes
- Printed circuit board production
Problems Solved
- Precise exposure of shot regions on a substrate
- Control of acceleration/deceleration for optimal exposure
- Efficient use of resources during the exposure process
Benefits
- Improved accuracy in exposing shot regions
- Enhanced control over driving the stage
- Increased efficiency in the exposure process
Original Abstract Submitted
An exposure apparatus for exposing a plurality of shot regions on a substrate, including a stage configured to hold and drive the substrate, and a control unit configured to control driving of the stage based on a driving profile that defines the driving of the stage, wherein the driving profile is formed by connecting a first acceleration profile that controls acceleration/deceleration of the stage in a non-exposure section that does not include an exposure section where the shot region is exposed and a second acceleration profile that controls the acceleration/deceleration of the stage in the exposure section, the second acceleration profile is formed by a curve, and the control unit determines the first acceleration profile and the second acceleration profile for each of the plurality of shot regions based on information about a size of the shot region.
