18336859. LITHOGRAPHY SYSTEM AND METHODS (Taiwan Semiconductor Manufacturing Co., Ltd.)
Jump to navigation
Jump to search
Contents
LITHOGRAPHY SYSTEM AND METHODS
Organization Name
Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor(s)
Ming-Hsin Chen of Hsinchu (TW)
LITHOGRAPHY SYSTEM AND METHODS
This abstract first appeared for US patent application 18336859 titled 'LITHOGRAPHY SYSTEM AND METHODS
Original Abstract Submitted
A method includes: protecting a mask of a mask assembly by a frame thereon during translating the mask assembly to a position associated with a region of a substrate, the frame having height less than a focal plane associated with a selected particle size; directing extreme ultraviolet (EUV) radiation toward the mask; reflecting radiation carrying a pattern of the mask toward the mask layer; forming a feature of a semiconductor device in a layer underlying the mask layer according to the pattern.
