18333598. CLEANING MEASUREMENT AND CONTROL SYSTEM (Hamilton Sundstrand Corporation)
Contents
CLEANING MEASUREMENT AND CONTROL SYSTEM
Organization Name
Hamilton Sundstrand Corporation
Inventor(s)
Yasir Al-nadawi of Vernon CT (US)
Amit Surana of Newington CT (US)
Konda Reddy Chevva of Ellington CT (US)
CLEANING MEASUREMENT AND CONTROL SYSTEM
This abstract first appeared for US patent application 18333598 titled 'CLEANING MEASUREMENT AND CONTROL SYSTEM
Original Abstract Submitted
A controller operable to perform cleaning system control operations includes generating, using a processor system, a first electronic cleanliness measurement (ECM) associated with a cleaning target. Based at least in part on a determination that the first ECM exceeds a threshold, the processor system is used to generate a first cleaning system protocol. The processor system executes the first cleaning system protocol to control a cleaning system operable to clean debris from the cleaning target.
