18327138. IMPRINT SYSTEM, SUBSTRATE, IMPRINT METHOD, REPLICA MOLD MANUFACTURING METHOD, AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
IMPRINT SYSTEM, SUBSTRATE, IMPRINT METHOD, REPLICA MOLD MANUFACTURING METHOD, AND ARTICLE MANUFACTURING METHOD
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IMPRINT SYSTEM, SUBSTRATE, IMPRINT METHOD, REPLICA MOLD MANUFACTURING METHOD, AND ARTICLE MANUFACTURING METHOD - A simplified explanation of the abstract
This abstract first appeared for US patent application 18327138 titled 'IMPRINT SYSTEM, SUBSTRATE, IMPRINT METHOD, REPLICA MOLD MANUFACTURING METHOD, AND ARTICLE MANUFACTURING METHOD
Simplified Explanation
The abstract describes an imprint system that transfers a pattern from a mold to an imprint material on a substrate. The system includes a formation unit that applies a predetermined material onto the substrate's surface to create a substrate-side mark, and then transfers and processes the mark on the imprint material. The system also includes an alignment unit that aligns the substrate-side mark with a mold-side mark on the mold.
- The system forms a substrate-side mark by applying a predetermined material onto the substrate's surface.
- The substrate-side mark is then transferred and processed on the imprint material.
- The system aligns the substrate-side mark with a mold-side mark on the mold.
Potential applications of this technology:
- Semiconductor manufacturing: This imprint system can be used in the production of semiconductor devices, where precise patterns need to be transferred onto substrates.
- Optical devices: The system can be applied in the fabrication of optical devices, such as lenses or waveguides, where accurate pattern transfer is crucial.
- Nanotechnology: This technology can be utilized in nanoscale manufacturing processes, enabling the creation of intricate patterns on nanoscale substrates.
Problems solved by this technology:
- Precise pattern transfer: The system ensures accurate alignment and transfer of patterns from the mold to the imprint material, resulting in high-quality imprints.
- Efficient processing: By processing the substrate-side mark before transferring it to the imprint material, the system optimizes the imprinting process and improves overall efficiency.
Benefits of this technology:
- Improved accuracy: The alignment unit ensures precise alignment between the substrate-side mark and the mold-side mark, leading to accurate pattern transfer.
- Enhanced efficiency: By processing the substrate-side mark separately, the system streamlines the imprinting process, reducing production time and increasing efficiency.
- Versatile applications: The system can be applied in various industries, including semiconductor manufacturing, optical devices, and nanotechnology, providing versatility and adaptability.
Original Abstract Submitted
An imprint system transfers a pattern formed on a mold to an imprint material supplied onto a substrate and includes: a formation unit configured to form a desired substrate-side mark including a predetermined material by applying the predetermined material onto the surface of the substrate and then transferring the substrate-side mark on the predetermined material and processing the substrate-side mark, wherein a difference in a predetermined optical property between the predetermined material and the imprint material is larger than a difference in the predetermined optical property between the imprint material and the substrate; and an alignment unit configured to align the substrate-side mark including the predetermined material and a mold-side mark provided on the mold.
