18320451. SEMICONDUCTOR DEVICE simplified abstract (Samsung Electronics Co., Ltd.)

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SEMICONDUCTOR DEVICE

Organization Name

Samsung Electronics Co., Ltd.

Inventor(s)

Intak Jeon of Suwon-si (KR)

Hanjin Lim of Suwon-si (KR)

Hyungsuk Jung of Suwon-si (KR)

SEMICONDUCTOR DEVICE - A simplified explanation of the abstract

This abstract first appeared for US patent application 18320451 titled 'SEMICONDUCTOR DEVICE

Simplified Explanation

The semiconductor device described in the patent application consists of a lower structure with a lower electrode, an upper electrode covering the lower electrode, and a dielectric structure between the two electrodes. The dielectric structure is made up of two dielectric films - one with a first material and the other with a second material different from the first.

  • Lower structure with lower electrode
  • Upper electrode covering lower electrode
  • Dielectric structure with two dielectric films of different materials
  • First dielectric film with a first surface in contact with lower electrode
  • Second dielectric film with a first portion extending from second surface towards first surface

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      1. Potential Applications
  • Semiconductor manufacturing
  • Electronics industry
  • Integrated circuits
      1. Problems Solved
  • Improved performance of semiconductor devices
  • Enhanced reliability
  • Better insulation between electrodes
      1. Benefits
  • Higher efficiency
  • Increased durability
  • Enhanced functionality


Original Abstract Submitted

A semiconductor device includes a lower structure; a lower electrode on the lower structure; an upper electrode covering the lower electrode on the lower structure; and a dielectric structure disposed between the lower electrode and the upper electrode. The dielectric structure includes a first dielectric film including a first material and a second dielectric film including a second material different from the first material. The first dielectric film includes a first surface in contact with or facing the lower electrode and a second surface facing the first surface. The second dielectric film includes a first portion disposed in an opening of the first dielectric film and extending in a direction from the second surface toward the first surface.