18317395. SEMICONDUCTOR MEASUREMENT APPARATUS simplified abstract (Samsung Electronics Co., Ltd.)
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SEMICONDUCTOR MEASUREMENT APPARATUS
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SEMICONDUCTOR MEASUREMENT APPARATUS - A simplified explanation of the abstract
This abstract first appeared for US patent application 18317395 titled 'SEMICONDUCTOR MEASUREMENT APPARATUS
The semiconductor measurement apparatus described in the patent application includes an illumination unit, an image sensor, an optical unit, and a control unit.
- The illumination unit irradiates light to the sample.
- The image sensor receives light reflected from the sample and outputs multiple interference images representing interference patterns of polarization components of light.
- The optical unit, in the path through which the image sensor receives light, includes an objective lens above the sample.
- The control unit processes the multi-interference image to obtain measurement parameters determined from the polarization components at each of a plurality of azimuth angles defined on a plane perpendicular to the path of light incident to the image sensor.
- The control unit can determine a selected critical dimension to be measured from a structure in the sample based on measurement parameters.
- The illumination unit and/or the optical unit may include a polarizer and a compensator having a ¼ wave plate.
Potential Applications: - Semiconductor manufacturing for quality control and process optimization. - Nanotechnology research for precise measurements and analysis.
Problems Solved: - Accurate measurement of critical dimensions in semiconductor structures. - Enhanced control and optimization of manufacturing processes.
Benefits: - Improved quality control in semiconductor manufacturing. - Increased efficiency and accuracy in nanotechnology research.
Commercial Applications: Title: Advanced Semiconductor Measurement Apparatus for Precision Manufacturing This technology can be utilized in semiconductor fabrication facilities for quality control and process optimization, as well as in research institutions focusing on nanotechnology advancements. The precise measurements and analysis provided by this apparatus can lead to improved product quality and process efficiency in the semiconductor industry.
Questions about Semiconductor Measurement Apparatus: 1. How does the apparatus improve measurement accuracy in semiconductor structures? The apparatus utilizes interference patterns of polarization components of light to determine measurement parameters, allowing for precise analysis of critical dimensions in semiconductor structures.
2. What are the potential applications of this technology beyond semiconductor manufacturing? This technology can also be applied in nanotechnology research for precise measurements and analysis of nanostructures, offering valuable insights for various scientific and industrial applications.
Original Abstract Submitted
A semiconductor measurement apparatus may include an illumination unit configured to irradiate light to the sample, an image sensor configured to receive light reflected from the sample and output multiple interference images representing interference patterns of polarization components of light, an optical unit in a path through which the image sensor receives light and including an objective lens above the sample, and a control unit configured to obtain, by processing the multi-interference image, measurement parameters determined from the polarization components at each of a plurality of azimuth angles defined on a plane perpendicular to a path of light incident to the image sensor. The control unit may be configured to determine a selected critical dimension to be measured from a structure in the sample based on measurement parameters. The illumination unit and/or the optical unit may include a polarizer and a compensator having a ¼ wave plate.
