18291075. PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, PRINTED WIRING BOARD, AND METHOD FOR PRODUCING PRINTED WIRING BOARD simplified abstract (Resonac Corporation)

From WikiPatents
Jump to navigation Jump to search

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, PRINTED WIRING BOARD, AND METHOD FOR PRODUCING PRINTED WIRING BOARD

Organization Name

Resonac Corporation

Inventor(s)

Naoki Yamashita of Tokyo (JP)

Hayato Sawamoto of Tokyo (JP)

Kaho Yamaguchi of Tokyo (JP)

Yasuyuki Oyama of Tokyo (JP)

Arisa Yamakawa of Tokyo (JP)

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, PRINTED WIRING BOARD, AND METHOD FOR PRODUCING PRINTED WIRING BOARD - A simplified explanation of the abstract

This abstract first appeared for US patent application 18291075 titled 'PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, PRINTED WIRING BOARD, AND METHOD FOR PRODUCING PRINTED WIRING BOARD

The present disclosure pertains to a photosensitive resin composition for a permanent resist, consisting of an acid-modified vinyl group-containing resin, a photopolymerization initiator, and a photopolymerizable compound with specific ethylenically unsaturated groups.

  • The composition includes an acid-modified vinyl group-containing resin (A).
  • It also contains a photopolymerization initiator (B).
  • The photopolymerizable compound (C) comprises a compound with four or more ethylenically unsaturated groups and another with three or fewer ethylenically unsaturated groups.

Potential Applications: - Semiconductor manufacturing - Printed circuit board production - Microfabrication processes

Problems Solved: - Improved resolution in lithography - Enhanced adhesion properties - Increased durability of resist materials

Benefits: - Higher precision in pattern transfer - Reduced material waste - Enhanced overall efficiency in manufacturing processes

Commercial Applications: Title: Advanced Photosensitive Resin Composition for Microfabrication Processes This technology can be utilized in the semiconductor industry, electronics manufacturing, and other high-precision industries to enhance the quality and efficiency of production processes.

Questions about Photosensitive Resin Composition: 1. How does the composition improve resolution in lithography?

  - The composition's specific components enhance the ability to transfer intricate patterns onto substrates with high precision.

2. What are the key benefits of using a photosensitive resin composition in microfabrication processes?

  - The benefits include improved adhesion, durability, and overall efficiency in manufacturing processes.


Original Abstract Submitted

The present disclosure relates to a photosensitive resin composition for a permanent resist, the photosensitive resin composition including: (A) an acid-modified vinyl group-containing resin; (B) a photopolymerization initiator; and (C) a photopolymerizable compound, in which the photopolymerizable compound includes a photopolymerizable compound having four or more ethylenically unsaturated groups and a photopolymerizable compound having three or fewer ethylenically unsaturated groups.