18279694. OPERATING A METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHODS THEREOF simplified abstract (ASML NETHERLANDS B.V.)
Contents
OPERATING A METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHODS THEREOF
Organization Name
Inventor(s)
Bram Paul Theodoor Van Goch of Maarheeze (NL)
Johan Gertrudis Cornelis Kunnen of Weert (NL)
OPERATING A METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHODS THEREOF - A simplified explanation of the abstract
This abstract first appeared for US patent application 18279694 titled 'OPERATING A METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHODS THEREOF
The method described in the abstract involves detecting data related to a patterning device and/or a lithographic apparatus, choosing from a variety of actions when a decision is made not to proceed, and then carrying out the selected action on the patterning device and/or lithographic apparatus.
- Detecting data associated with a patterning device and/or lithographic apparatus
- Selecting an action from a range of options when a decision is made not to proceed
- Implementing the chosen action on the patterning device and/or lithographic apparatus
Potential Applications: - Semiconductor manufacturing - Nanotechnology research - Optical device fabrication
Problems Solved: - Efficient handling of data in lithographic processes - Streamlining decision-making in equipment maintenance
Benefits: - Improved productivity in manufacturing processes - Enhanced equipment reliability - Cost savings through optimized actions
Commercial Applications: Title: "Enhanced Data Handling Method for Lithographic Processes" This technology could be utilized in semiconductor fabrication facilities, nanotechnology research labs, and companies specializing in optical device production. The market implications include increased efficiency, reduced downtime, and improved product quality.
Prior Art: Researchers interested in this technology may want to explore patents related to lithographic equipment maintenance, data processing in semiconductor manufacturing, and automation in nanotechnology research.
Frequently Updated Research: Researchers in the field of lithography may find the latest advancements in data handling methods, equipment maintenance strategies, and automation technologies relevant to this innovation.
Questions about Lithographic Data Handling: 1. How does this method improve decision-making in lithographic processes? 2. What are the potential cost-saving benefits of implementing this technology in semiconductor manufacturing?
Original Abstract Submitted
A method includes detecting data associated with a patterning device and/or a lithographic apparatus, performing an action from a plurality of actions when a determination not to proceed is made, and performing the action on the patterning device and/or a lithographic apparatus.
