18239101. DEPOSITION APPARATUS simplified abstract (Samsung Display Co., LTD.)
Contents
DEPOSITION APPARATUS
Organization Name
Inventor(s)
Jongyoon Lee of Yongin-si (KR)
DEPOSITION APPARATUS - A simplified explanation of the abstract
This abstract first appeared for US patent application 18239101 titled 'DEPOSITION APPARATUS
Simplified Explanation
- Deposition apparatus includes a chamber, a deposition source with nozzles in a first direction, and a deposition angle limiter. - The deposition angle limiter has a low-incident angle limiting plate between adjacent nozzles and a high-incident angle limiting plate around a portion of a nozzle. - The first nozzle extends in a height direction.
- Potential Applications:**
- Semiconductor manufacturing - Thin film deposition - Solar cell production
- Problems Solved:**
- Control of deposition angles - Prevention of unwanted deposition on adjacent areas - Improving overall deposition accuracy
- Benefits:**
- Enhanced precision in deposition processes - Reduction in material waste - Increased efficiency in manufacturing operations
Original Abstract Submitted
A deposition apparatus includes: a chamber; a deposition source disposed in the chamber to include nozzles arranged in a first direction; and a deposition angle limiter disposed on the deposition source in the chamber. The deposition angle limiter includes: a low-incident angle limiting plate disposed between adjacent first and second nozzles among the nozzles and spaced apart from the first nozzle by a first height in a height direction intersecting the first direction; and a high-incident angle limiting plate surrounding at least a portion of the first nozzle and spaced apart from the first nozzle by a second height in the height direction. The first nozzle extends in the height direction.
