18237062. PHOTOMASK INCLUDING MONITORING MARK simplified abstract (SAMSUNG DISPLAY CO., LTD.)
Contents
PHOTOMASK INCLUDING MONITORING MARK
Organization Name
Inventor(s)
Yoon Yeol Lee of Yongin-si (KR)
PHOTOMASK INCLUDING MONITORING MARK - A simplified explanation of the abstract
This abstract first appeared for US patent application 18237062 titled 'PHOTOMASK INCLUDING MONITORING MARK
The patent application describes a photomask comprising a base, a pattern layer, and a monitoring mark with multiple test patterns.
- The monitoring mark includes a series of test patterns with edges facing each other in different directions.
- The spacing between the edges of each test pattern is consistent and defined by a mathematical formula.
- The design allows for precise monitoring and alignment during the manufacturing process.
Potential Applications:
- Semiconductor manufacturing
- Microelectronics industry
- Optical lithography processes
Problems Solved:
- Ensures accurate alignment of the photomask during fabrication
- Improves the quality and consistency of the final product
Benefits:
- Enhances the efficiency of the manufacturing process
- Reduces errors and defects in the production of semiconductor devices
Commercial Applications:
- Photomask fabrication companies
- Semiconductor manufacturers
- Research institutions in the microelectronics field
Questions about the technology: 1. How does the monitoring mark contribute to the overall quality of the photomask? 2. What are the specific advantages of using this design in semiconductor manufacturing processes?
Frequently Updated Research:
- Ongoing studies on improving photomask technology for advanced semiconductor applications.
Original Abstract Submitted
A photomask includes: a base, a pattern layer disposed on the base, and a monitoring mark including a first sub-monitoring mark which includes a plurality of test patterns defined as openings penetrating the base and the pattern layer. The first sub-monitoring mark includes first through n-th test patterns, each of the first through n-th test patterns includes a first edge and a second edge extending along a first direction and facing each other along a second direction different from the first direction, the second edge of a j-th test pattern among the first through n-th test patterns is spaced apart from the first edge of the j-th test pattern along the second direction by (kn+j) times a unit width that is constant along the second direction, and n is a natural number more than 1, j is a natural number from 1 to n, and k is a natural number.