18224664. PLASMA MONITORING SYSTEM simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
Contents
PLASMA MONITORING SYSTEM
Organization Name
Inventor(s)
Yunsong Jeong of Suwon-si (KR)
PLASMA MONITORING SYSTEM - A simplified explanation of the abstract
This abstract first appeared for US patent application 18224664 titled 'PLASMA MONITORING SYSTEM
The patent application describes a plasma monitoring system used in semiconductor processes.
- The system includes a chamber with an interior space for performing semiconductor processes using plasma.
- An optical window is included in the chamber for monitoring the plasma.
- A substrate stage supports the semiconductor substrate within the chamber.
- A light collecting device on the substrate stage collects light from the plasma and transfers it to the optical window.
- A light analyzer with a spectrometer obtains an optical spectrum from the collected light to map the state of the plasma.
Potential Applications: - Semiconductor manufacturing processes - Plasma etching and deposition processes - Quality control in semiconductor production
Problems Solved: - Monitoring and analyzing plasma in real-time during semiconductor processes - Ensuring process consistency and quality control
Benefits: - Improved process control and optimization - Enhanced product quality and yield - Real-time monitoring for quick adjustments
Commercial Applications: Title: "Advanced Plasma Monitoring System for Semiconductor Manufacturing" This technology can be used in semiconductor fabrication facilities to enhance process control, improve product quality, and increase overall efficiency. It can be marketed to semiconductor manufacturers looking to optimize their production processes.
Questions about Plasma Monitoring Systems: 1. How does the light collecting device work in the plasma monitoring system? The light collecting device on the substrate stage collects light from the plasma through through-holes and transfers it to the optical window for analysis.
2. What is the role of the spectrometer in the light analyzer? The spectrometer in the light analyzer obtains an optical spectrum from the collected light to map the state of the plasma during the semiconductor process.
Original Abstract Submitted
A plasma monitoring system includes a chamber with an interior space, the chamber being configured to perform a semiconductor process on a semiconductor substrate using plasma in the interior space, and the chamber including an optical window, a substrate stage within the chamber to support the semiconductor substrate, a light collecting device on the substrate stage, the light collecting device including a body and light collectors, the body having through holes therethrough, and the light collectors being configured to collect light respectively incident on the through holes from the plasma and to transfer the collected lights onto the optical window, and a light analyzer including a spectrometer that is configured to obtain an optical spectrum from each light irradiated onto the optical window, and to map a state of the plasma from the optical spectrum to correspond to positions of the through holes.
