18216028. POST BAKING APPARATUS simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)

POST BAKING APPARATUS

Organization Name

SAMSUNG ELECTRONICS CO., LTD.

Inventor(s)

Jaehong Lim of Suwon-si (KR)

Youngho Hwang of Suwon-si (KR)

Byungjo Kim of Suwon-si (KR)

Sangki Nam of Suwon-si (KR)

Suyoung Yoo of Suwon-si (KR)

Sanghyun Lim of Suwon-si (KR)

Youngkyun Im of Suwon-si (KR)

Hyungkyu Choi of Suwon-si (KR)

Seok Heo of Suwon-si (KR)

POST BAKING APPARATUS - A simplified explanation of the abstract

This abstract first appeared for US patent application 18216028 titled 'POST BAKING APPARATUS

The post baking apparatus described in the patent application includes a baking chamber, a lower heater, an applier, and a controller.

• The baking chamber is designed to accommodate a substrate with an exposed photoresist film.
• The lower heater is positioned beneath the substrate to heat the exposed photoresist film.
• The applier applies an electric field or a magnetic field to the exposed photoresist film in a vertical direction, controlling diffusions of acid or secondary electrons generated from the film in a horizontal direction.
• The controller is responsible for managing the operation of the applier.

Potential Applications: - Semiconductor manufacturing processes - Photolithography in the production of microelectronics - Thin film deposition in the fabrication of electronic devices

Problems Solved: - Control of diffusions of acid or secondary electrons in photoresist films - Enhanced precision in semiconductor manufacturing processes

Benefits: - Improved accuracy and efficiency in photolithography - Enhanced quality control in thin film deposition processes - Increased productivity in semiconductor manufacturing

Commercial Applications: Title: Advanced Semiconductor Manufacturing Equipment for Enhanced Precision This technology could be utilized in semiconductor fabrication facilities to improve the accuracy and efficiency of photolithography processes, ultimately leading to higher quality electronic devices and increased productivity in the industry.

Prior Art: Researchers and engineers in the field of semiconductor manufacturing equipment and photolithography processes may find relevant prior art in patents related to photoresist film processing and control of diffusions in thin films.

Frequently Updated Research: Ongoing research in the field of semiconductor manufacturing equipment and photolithography techniques may provide further insights into the optimization of photoresist film processing and control of diffusions in thin films.

Questions about the Technology: 1. How does the applier control diffusions of acid or secondary electrons in the exposed photoresist film? 2. What are the potential implications of this technology for the semiconductor industry?

Original Abstract Submitted

A post baking apparatus comprising a baking chamber configured to receive a substrate with an exposed photoresist film, a lower heater in the baking chamber under the substrate to heat the exposed photoresist film, an applier applying an electric field or a magnetic field to the exposed photoresist film along a vertical direction, which is substantially perpendicular to an upper surface of the exposed photoresist film, to control diffusions of an acid or a secondary electron, which are generated from the exposed photoresist film, along a horizontal direction, and a controller configured to control an operation of the applier.