18210884. INTEGRATED GAS BOX AND ION SOURCE (Applied Materials, Inc.)
Contents
INTEGRATED GAS BOX AND ION SOURCE
Organization Name
Inventor(s)
William H. Leavitt of Haverhill MA (US)
Shengwu Chang of South Hamilton MA (US)
William H. Park, Jr. of Marblehead MA (US)
INTEGRATED GAS BOX AND ION SOURCE
This abstract first appeared for US patent application 18210884 titled 'INTEGRATED GAS BOX AND ION SOURCE
Original Abstract Submitted
An integrated gas box is disclosed. The integrated gas box is an enclosure, wherein one wall of the enclosure includes an aperture. A bushing is affixed to the exterior of this wall. The distal end of the bushing has a flange that is affixed to a wall of the vacuum chamber. The ion source is introduced into the bushing through an access door in the enclosure and slides into the aperture. The base flange of the ion source is sufficiently large such that it cannot pass through the aperture and forms a seal between the bushing and the interior of the integrated gas box. The integrated gas box includes the gas canisters and associated valves which are used to supply feed gas and diluent gasses to the ion source. The integrated gas box also houses the power supplies used to bias the components within the ion source.
