18193643. SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME simplified abstract (SK hynix Inc.)
Contents
SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
Organization Name
Inventor(s)
Seung Hwan Kim of Gyeonggi-do (KR)
SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME - A simplified explanation of the abstract
This abstract first appeared for US patent application 18193643 titled 'SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
The semiconductor device described in the abstract consists of a lower structure, multiple horizontal conductive layers oriented parallel to the lower structure's surface, a vertical conductive line connected to one side of the horizontal layers, and several reservoir capacitors stacked vertically over the lower structure.
- The device features horizontal conductive layers aligned parallel to the lower structure's surface.
- A vertical conductive line is connected to one side of the horizontal layers, extending perpendicular to the lower structure's surface.
- Reservoir capacitors are coupled to the other side of the horizontal layers and stacked vertically over the lower structure.
Potential Applications: - This technology can be applied in integrated circuits, microprocessors, and other semiconductor devices requiring efficient conductive pathways. - It can enhance the performance and functionality of electronic devices by improving signal transmission and power distribution.
Problems Solved: - Provides a compact and efficient design for semiconductor devices. - Enhances the conductivity and connectivity within the device.
Benefits: - Improved signal transmission and power distribution. - Compact design for space-saving in electronic devices.
Commercial Applications: Title: "Enhanced Semiconductor Devices for Improved Performance" This technology can be utilized in the production of advanced electronic devices such as smartphones, tablets, and computers, enhancing their overall performance and efficiency in signal processing and power management.
Questions about the technology: 1. How does the vertical conductive line improve the functionality of the semiconductor device? 2. What are the advantages of using reservoir capacitors in this design?
Frequently Updated Research: Stay updated on the latest advancements in semiconductor technology to ensure the continued improvement and innovation in electronic devices.
Original Abstract Submitted
A semiconductor device includes a lower structure; a plurality of horizontal conductive layers that are oriented horizontally in a direction parallel to a surface of the lower structure; a vertical conductive line commonly coupled to first-side ends of the horizontal conductive layers and extending in a direction perpendicular to the surface of the lower structure; and a plurality of reservoir capacitors respectively coupled to second-side ends of the horizontal conductive layers and vertically stacked over the lower structure.
