18192329. SEMICONDUCTOR DEVICES simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
SEMICONDUCTOR DEVICES
Organization Name
Inventor(s)
SEMICONDUCTOR DEVICES - A simplified explanation of the abstract
This abstract first appeared for US patent application 18192329 titled 'SEMICONDUCTOR DEVICES
Simplified Explanation
The patent application describes a semiconductor device with a specific structure involving contact plugs, spacer structures, and bit line structures.
- The device includes a first contact plug structure on a substrate, a lower spacer structure on the sidewall of the first contact plug structure, and a bit line structure on the first contact plug structure.
- The first contact plug structure consists of a conductive pad, an ohmic contact pattern, and a conductive filling pattern.
- The conductive filling pattern is made of metal and has a lower portion with a wider width and an upper portion with a narrower width.
- The lower spacer structure is in contact with the sidewall of the conductive filling pattern.
Potential applications of this technology:
- This semiconductor device structure can be used in various electronic devices such as smartphones, computers, and tablets.
- It can be applied in memory devices, logic circuits, and other semiconductor components.
Problems solved by this technology:
- The specific structure of the device helps to improve the performance and efficiency of the semiconductor device.
- It provides a more reliable and stable connection between the different components of the device.
Benefits of this technology:
- The improved performance and efficiency of the semiconductor device can lead to faster and more reliable electronic devices.
- The stable connection between components enhances the overall durability and lifespan of the device.
Original Abstract Submitted
A semiconductor device including a first contact plug structure on a substrate, a lower spacer structure on a sidewall of the first contact plug structure, and a bit line structure on the first contact plug structure and including a conductive structure and an insulation structure stacked in a vertical direction substantially perpendicular to an upper surface of the substrate may be provided. The first contact plug structure may include a conductive pad contacting the upper surface of the substrate, an ohmic contact pattern on the conductive pad, and a conductive filling pattern on the ohmic contact pattern. The conductive filling pattern may include metal, and include a lower portion having a relatively large width and an upper portion having a relatively small width. The lower spacer structure may contact a sidewall of the conductive filling pattern.
- SAMSUNG ELECTRONICS CO., LTD.
- Jongmin Kim of Suwon-si (KR)
- Sohyun Park of Suwon-si (KR)
- Chansic Yoon of Suwon-si (KR)
- Dongmin Choi of Suwon-si (KR)
- Seungbo Ko of Suwon-si (KR)
- Hyosub Kim of Suwon-si (KR)
- Jingkuk Bae of Suwon-si (KR)
- Woojin Jeong of Suwon-si (KR)
- Eunkyung Cha of Suwon-si (KR)
- Junhyeok Ahn of Suwon-si (KR)
- H10B12/00