18192316. ORGANIC SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND PATTERN FORMATION METHOD USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
ORGANIC SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND PATTERN FORMATION METHOD USING THE SAME
Organization Name
Inventor(s)
Yoonhyun Kwak of Suwon-si (KR)
ORGANIC SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND PATTERN FORMATION METHOD USING THE SAME - A simplified explanation of the abstract
This abstract first appeared for US patent application 18192316 titled 'ORGANIC SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND PATTERN FORMATION METHOD USING THE SAME
The abstract of the patent application describes an organic salt represented by Formula 1, a photoresist composition containing the salt, and a method for patterning using the salt.
- Simplified Explanation:
The patent application introduces a new organic salt, Formula 1, which is used in a photoresist composition for patterning.
- Key Features and Innovation:
- Introduction of a novel organic salt represented by Formula 1 - Utilization of the salt in a photoresist composition for patterning applications
- Potential Applications:
- Semiconductor manufacturing - Microelectronics industry - Photolithography processes
- Problems Solved:
- Enhancing resolution and precision in patterning processes - Improving the performance of photoresist compositions
- Benefits:
- Increased efficiency in patterning processes - Enhanced quality of patterns produced - Potential cost savings in manufacturing processes
- Commercial Applications:
"Organic Salt for Advanced Photoresist Patterning in Semiconductor Manufacturing"
- Questions about the Technology:
1. How does the organic salt represented by Formula 1 improve the performance of photoresist compositions? 2. What specific advantages does this new salt offer compared to existing materials in patterning applications?
- Frequently Updated Research:
Stay updated on the latest advancements in organic salts for photoresist applications to ensure optimal performance and efficiency in semiconductor manufacturing processes.
Original Abstract Submitted
Provided are an organic salt represented by Formula 1, a photoresist composition including the same, and a pattern method using the same:
