18187558. Impedance Matching Network and Control Method simplified abstract (Tokyo Electron Limited)
Contents
Impedance Matching Network and Control Method
Organization Name
Inventor(s)
John Carroll of Austin TX (US)
Jianping Zhao of Austin TX (US)
Impedance Matching Network and Control Method - A simplified explanation of the abstract
This abstract first appeared for US patent application 18187558 titled 'Impedance Matching Network and Control Method
The abstract describes a matching circuit for a plasma tool that includes an impedance matching network to ensure the impedance of the plasma chamber matches that of the power supply during operation in a specific frequency range.
- The matching circuit includes a first pi-network and a second pi-network connected in series between the plasma chamber and the power supply.
- The impedance matching network ensures that the impedance of the plasma chamber matches that of the power supply in the predetermined frequency range.
- This technology optimizes the power transfer between the power supply and the plasma chamber, enhancing the efficiency of the plasma tool.
- By maintaining impedance matching, the circuit helps stabilize the plasma process and improve overall performance.
- The matching circuit is designed to operate within a specific frequency range to achieve optimal results.
Potential Applications: - Semiconductor manufacturing - Thin film deposition - Plasma etching processes
Problems Solved: - Inefficient power transfer in plasma tools - Instability in plasma processes due to impedance mismatch - Suboptimal performance of plasma chambers
Benefits: - Improved efficiency in plasma tool operation - Enhanced stability and performance of plasma processes - Optimal power transfer for better results
Commercial Applications: Title: "Impedance Matching Circuit for Enhanced Plasma Tool Performance" This technology can be utilized in industries such as semiconductor manufacturing, thin film deposition, and plasma etching processes to improve efficiency and performance. The market implications include increased productivity and cost savings for companies utilizing plasma tools.
Questions about Impedance Matching Circuit for Plasma Tool: 1. How does impedance matching impact the performance of a plasma tool? Impedance matching ensures optimal power transfer between the power supply and the plasma chamber, leading to improved efficiency and stability in plasma processes.
2. What are the key components of the impedance matching network in the matching circuit? The impedance matching network consists of a first pi-network and a second pi-network connected in series between the plasma chamber and the power supply.
Original Abstract Submitted
A matching circuit for a plasma tool including an impedance matching network configured to be coupled between a power supply and a plasma chamber, the plasma chamber being configured to operate a plasma in a predetermined frequency range, the power supply being configured to provide power for the plasma chamber, the impedance matching network including a first pi-network and a second pi-network in series coupled between an input of the plasma chamber and an output of the power supply, and the impedance matching network being configured such that, during operation of the plasma chamber in the predetermined frequency range, an impedance of the impedance matching network and the plasma chamber equals an impedance of the power supply.
