18186994. PROTECTIVE MEMBRANE FOR PHOTO LITHOGRAPHY, PELLICLE INCLUDING THE SAME, AND METHOD OF FORMING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)

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PROTECTIVE MEMBRANE FOR PHOTO LITHOGRAPHY, PELLICLE INCLUDING THE SAME, AND METHOD OF FORMING THE SAME

Organization Name

SAMSUNG ELECTRONICS CO., LTD.

Inventor(s)

MUN JA Kim of Suwon-si (KR)

Seung Hyun Lee of Seongnam-si (KR)

Jae Sun Jung of Seongnam-si (KR)

Byungchul Yoo of Suwon-si (KR)

Byunghoon Lee of Suwon-si (KR)

Changyoung Jeong of Suwon-si (KR)

Deok Hyun Kim of Seongnam-si (KR)

Deok Hyun Cho of Seongnam-si (KR)

PROTECTIVE MEMBRANE FOR PHOTO LITHOGRAPHY, PELLICLE INCLUDING THE SAME, AND METHOD OF FORMING THE SAME - A simplified explanation of the abstract

This abstract first appeared for US patent application 18186994 titled 'PROTECTIVE MEMBRANE FOR PHOTO LITHOGRAPHY, PELLICLE INCLUDING THE SAME, AND METHOD OF FORMING THE SAME

Simplified Explanation

The patent application describes protective membranes for lithography that have a core layer made of carbon, an interface layer on the core layer, and a protective layer on the interface layer. The interface layer contains a reactive group bonded to a carbon atom of the core layer, and the reactive group includes oxygen or nitrogen. The protective layer contains an element "M" that is bonded to the oxygen or nitrogen of the reactive group.

  • The patent application describes protective membranes for lithography.
  • The membranes consist of a core layer, an interface layer, and a protective layer.
  • The core layer is made of carbon.
  • The interface layer contains a reactive group bonded to a carbon atom of the core layer.
  • The reactive group includes oxygen or nitrogen.
  • The protective layer contains an element "M" bonded to the oxygen or nitrogen of the reactive group.

Potential Applications:

  • Lithography processes in semiconductor manufacturing.
  • Protection of sensitive surfaces during lithography.
  • Enhancing the performance and durability of lithography masks.

Problems Solved:

  • Protecting lithography masks from damage during the manufacturing process.
  • Improving the precision and accuracy of lithography processes.
  • Increasing the lifespan of lithography masks.

Benefits:

  • Enhanced protection for lithography masks.
  • Improved performance and durability of lithography processes.
  • Cost savings by extending the lifespan of lithography masks.


Original Abstract Submitted

Provided herein are protective membranes for lithography that include a core layer including carbon, an interface layer on the core layer, and a protective layer on the interface layer. The interface layer includes a reactive group bonded to a carbon atom of the core layer and the reactive group includes oxygen or nitrogen. The protective layer includes an element “M”, and the element “M” is bonded to the oxygen or nitrogen of the reactive group.

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