18124401. INDIRECT PLASMA HEALTH MONITORING simplified abstract (Applied Materials, Inc.)

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INDIRECT PLASMA HEALTH MONITORING

Organization Name

Applied Materials, Inc.

Inventor(s)

Tobin Kaufman-osborn of Arvada CO (US)

MARTIN Hilkene of Gilroy CA (US)

INDIRECT PLASMA HEALTH MONITORING - A simplified explanation of the abstract

This abstract first appeared for US patent application 18124401 titled 'INDIRECT PLASMA HEALTH MONITORING

The patent application describes a processing tool with a chamber and a remote plasma source (RPS) connected to the chamber through an adapter. The tool also includes an RPS match connected to the RPS, a first temperature sensor in the chamber, and a second temperature sensor in the adapter.

  • The processing tool includes a chamber and a remote plasma source (RPS) connected by an adapter.
  • An RPS match is connected to the RPS, along with a first temperature sensor in the chamber.
  • A second temperature sensor is located in the adapter.

Potential Applications: - Semiconductor manufacturing - Thin film deposition processes - Surface treatment in various industries

Problems Solved: - Enhanced control and monitoring of temperature in the processing tool - Improved efficiency and accuracy in plasma processing

Benefits: - Increased precision in processing - Enhanced quality of end products - Potential cost savings in manufacturing processes

Commercial Applications: - Semiconductor fabrication facilities - Research and development labs - Electronics manufacturing companies

Questions about the technology: 1. How does the remote plasma source improve processing efficiency? 2. What are the advantages of having temperature sensors in both the chamber and the adapter?


Original Abstract Submitted

Embodiments disclosed herein may include a processing tool. In an embodiment, the processing tool includes a chamber, and a remote plasma source (RPS) coupled to the chamber by an adapter. In an embodiment, the processing tool further comprises an RPS match coupled to the RPS, and a first temperature sensor in the chamber. In an embodiment, a second temperature sensor is in the adapter.