18089216. Power Compensation in PVD Chambers simplified abstract (Applied Materials, Inc.)
Contents
Power Compensation in PVD Chambers
Organization Name
Inventor(s)
Yida Lin of Santa Clara CA (US)
Xiangjin Xie of Fremont CA (US)
Martin Lee Riker of Round Rock TX (US)
Suhas Umesh of Sunnyvale CA (US)
Keith A. Miller of Mountain View CA (US)
Power Compensation in PVD Chambers - A simplified explanation of the abstract
This abstract first appeared for US patent application 18089216 titled 'Power Compensation in PVD Chambers
Simplified Explanation: The patent application describes methods and apparatus for controlling the processing of a substrate within a process chamber by analyzing the deposition profile of previously processed substrates and adjusting power parameters to achieve a desired deposition profile for unprocessed substrates.
- Statistical analysis is performed on measurements of the deposition profile of previously processed substrates.
- A model of the deposition profile as a function of power parameters is determined based on the statistical analysis.
- The measurements of the deposition profile are fitted to the model.
- A power parameter setpoint for the power supply is determined using the fitted model to achieve the desired deposition profile for unprocessed substrates.
- The power parameter setpoint is then set for processing the unprocessed substrate.
Potential Applications: 1. Semiconductor manufacturing 2. Thin film deposition processes 3. Solar panel production 4. Optical coatings
Problems Solved: 1. Inconsistent deposition profiles on substrates 2. Wastage of materials due to inefficient processing 3. Lack of control over the deposition process
Benefits: 1. Improved consistency in deposition profiles 2. Enhanced control over the deposition process 3. Reduction in material wastage 4. Increased efficiency in substrate processing
Commercial Applications: Optimizing Thin Film Deposition Processes for Semiconductor Manufacturing
Prior Art: Prior research in the field of thin film deposition processes and power modulation in process chambers can provide valuable insights into similar technologies.
Frequently Updated Research: Ongoing research in semiconductor manufacturing and thin film deposition processes may offer advancements in optimizing power parameters for improved substrate processing.
Questions about Thin Film Deposition Processes: 1. How does the statistical analysis of deposition profiles contribute to improving substrate processing? 2. What are the key factors influencing the determination of power parameter setpoints in the deposition process?
Original Abstract Submitted
Methods and apparatus for controlling processing of a substrate within a process chamber, comprising: performing statistical analysis on measurements of deposition profile of at least one previously processed substrate processed in the process chamber, wherein the deposition profile is based at least on modulating a power parameter of at least one power supply affecting a magnetron in the process chamber; determining, based on the statistical analysis, a model of the deposition profile as a function of at least the power parameter; fitting the measurements of deposition profile to the model; determining a power parameter setpoint for the at least one power supply using the fitted model based on a desired deposition profile of an unprocessed substrate; and setting the power parameter setpoint for processing the unprocessed substrate.
