18080828. TRANSISTORS WITH DIELECTRIC STACK ISOLATING BACKSIDE POWER RAIL simplified abstract (International Business Machines Corporation)
Contents
- 1 TRANSISTORS WITH DIELECTRIC STACK ISOLATING BACKSIDE POWER RAIL
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 TRANSISTORS WITH DIELECTRIC STACK ISOLATING BACKSIDE POWER RAIL - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Key Features and Innovation
- 1.6 Potential Applications
- 1.7 Problems Solved
- 1.8 Benefits
- 1.9 Commercial Applications
- 1.10 Prior Art
- 1.11 Frequently Updated Research
- 1.12 Questions about Semiconductor Structures
- 1.13 Original Abstract Submitted
TRANSISTORS WITH DIELECTRIC STACK ISOLATING BACKSIDE POWER RAIL
Organization Name
International Business Machines Corporation
Inventor(s)
Tao Li of Slingerlands NY (US)
Sagarika Mukesh of Albany NY (US)
Julien Frougier of Albany NY (US)
Nicolas Jean Loubet of Guilderland NY (US)
Ruilong Xie of Niskayuna NY (US)
TRANSISTORS WITH DIELECTRIC STACK ISOLATING BACKSIDE POWER RAIL - A simplified explanation of the abstract
This abstract first appeared for US patent application 18080828 titled 'TRANSISTORS WITH DIELECTRIC STACK ISOLATING BACKSIDE POWER RAIL
Simplified Explanation
The semiconductor structure described in the patent application includes a frontside source/drain region with a dielectric stack on the bottom surface, consisting of a first and second dielectric layer.
Key Features and Innovation
- Frontside source/drain region with dielectric stack
- First and second dielectric layers in the stack
Potential Applications
The technology can be applied in the semiconductor industry for advanced transistor structures.
Problems Solved
This technology addresses the need for improved performance and reliability in semiconductor devices.
Benefits
- Enhanced performance of semiconductor structures
- Increased reliability of transistor devices
Commercial Applications
Commercial Uses
The technology can be utilized in the production of high-performance semiconductor devices.
Market Implications
This innovation could lead to the development of more efficient and reliable electronic products.
Prior Art
Readers can explore prior research on semiconductor structures and dielectric stacks in the semiconductor industry.
Frequently Updated Research
Stay informed about the latest advancements in semiconductor technology and dielectric materials to enhance your understanding of this innovation.
Questions about Semiconductor Structures
What are the potential applications of this semiconductor structure technology?
The potential applications include advanced transistor structures in the semiconductor industry.
How does the dielectric stack improve the performance of semiconductor devices?
The dielectric stack on the bottom surface of the frontside source/drain region enhances the reliability and performance of semiconductor devices.
Original Abstract Submitted
A semiconductor structure includes a frontside source/drain region, and a dielectric stack disposed on a bottom surface of the frontside source/drain region. The dielectric stack includes a first dielectric layer and a second dielectric layer.
