18076234. THERMAL CHOKE PLATE simplified abstract (Applied Materials, Inc.)

THERMAL CHOKE PLATE

Organization Name

Applied Materials, Inc.

Inventor(s)

Vellaichamy Nagappan of Ramanathapuram (IN)

Viren Kalsekar of Mountain View CA (US)

Jeongmin Lee of San Ramon CA (US)

Vinay K. Prabhakar of Fremont CA (US)

Pratap Chandran of Bengaluru (IN)

Dharma Ratnam Srichurnam of Hyderabad (IN)

Azhar Khan of Dewas (IN)

Sumit Subhash Singh of Mumbai (IN)

Siva Chandrasekar of Hosur (IN)

Satish Radhakrishnan of San Jose CA (US)

THERMAL CHOKE PLATE - A simplified explanation of the abstract

This abstract first appeared for US patent application 18076234 titled 'THERMAL CHOKE PLATE

Simplified Explanation: The patent application describes choke plates for a substrate processing system with two apertures, one of which is laterally offset, and a purging system with multiple outlets.

• The choke plate has a first aperture and a second aperture, with the second aperture positioned to the side of the first.
• A flange on the plate creates a purging inlet.
• A rim on the plate has several purging outlets connected to the purging inlet and the first aperture.

Key Features and Innovation:

• Choke plate design with two apertures, one offset, for improved substrate processing.
• Purging system with multiple outlets for efficient gas flow control.
• Integration of purging inlet and outlets for enhanced performance.

Potential Applications: The technology can be used in semiconductor manufacturing, thin film deposition, and other substrate processing applications.

Problems Solved: The choke plates address issues related to gas flow control, uniformity, and efficiency in substrate processing systems.

Benefits:

• Improved gas flow control and uniformity.
• Enhanced substrate processing efficiency.
• Better overall system performance.

Commercial Applications: The technology can be applied in industries such as semiconductor manufacturing, solar panel production, and flat panel display manufacturing.

Prior Art: Prior research on choke plates and gas flow control systems in substrate processing may provide additional insights into the development of this technology.

Frequently Updated Research: Ongoing research on gas flow control, substrate processing efficiency, and semiconductor manufacturing may influence the further development and applications of this technology.

Questions about Choke Plates: 1. How do choke plates impact gas flow control in substrate processing systems? 2. What are the potential challenges in implementing choke plates with multiple apertures in industrial settings?

Original Abstract Submitted

Exemplary choke plates for use in a substrate processing system may include a plate defining a first aperture through the plate and a second aperture through the plate. The second aperture may be laterally offset from the first aperture. The plate may include a flange that defines a purging inlet. The plate may include a rim defining a plurality of purging outlets that are fluidly coupled with the purging inlet. Each of the plurality of purging outlets may be fluidly coupled with the first aperture.