18072021. SEMICONDUCTOR PROCESSING TOOL CLEANING simplified abstract (TEXAS INSTRUMENTS INCORPORATED)
Contents
- 1 SEMICONDUCTOR PROCESSING TOOL CLEANING
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 SEMICONDUCTOR PROCESSING TOOL CLEANING - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Original Abstract Submitted
SEMICONDUCTOR PROCESSING TOOL CLEANING
Organization Name
TEXAS INSTRUMENTS INCORPORATED
Inventor(s)
Gregory Mckee of Riverton UT (US)
SEMICONDUCTOR PROCESSING TOOL CLEANING - A simplified explanation of the abstract
This abstract first appeared for US patent application 18072021 titled 'SEMICONDUCTOR PROCESSING TOOL CLEANING
Simplified Explanation
The present disclosure relates to semiconductor processing tool cleaning for manufacturing integrated circuits.
- Flowing boron trichloride gas into the chamber for cleaning.
- Etching material layer over semiconductor substrate after cleaning process.
Potential Applications
The technology can be applied in semiconductor manufacturing processes to ensure clean and efficient operation of semiconductor processing tools.
Problems Solved
This technology solves the problem of maintaining cleanliness and functionality of semiconductor processing tools during the manufacturing of integrated circuits.
Benefits
The benefits of this technology include improved efficiency, reduced contamination, and increased reliability in semiconductor processing.
Potential Commercial Applications
The technology can be utilized in the semiconductor industry for the production of various electronic devices, such as microprocessors, memory chips, and sensors.
Possible Prior Art
One possible prior art could be the use of other reactive gases for cleaning semiconductor processing tools, but the exclusive use of boron trichloride gas as described in this patent application may be a novel approach.
Unanswered Questions
How does the exclusive use of boron trichloride gas impact the cleaning efficiency compared to other reactive gases?
The article does not provide a direct comparison between boron trichloride gas and other reactive gases in terms of cleaning efficiency. Further research or testing may be needed to determine the effectiveness of boron trichloride gas in semiconductor tool cleaning.
What are the potential safety considerations when using boron trichloride gas for cleaning semiconductor processing tools?
The article does not address potential safety considerations associated with the use of boron trichloride gas. It would be important to investigate any safety hazards or precautions that need to be taken when utilizing this gas in semiconductor processing environments.
Original Abstract Submitted
The present disclosure generally relates to semiconductor processing tool cleaning, such as may be included in semiconductor processing for manufacturing an integrated circuit (IC). In an example, a cleaning process is performed on an interior surface of a chamber of a semiconductor processing tool. The cleaning process includes flowing a reactive gas into an interior volume of the chamber. The interior volume is defined at least in part by the interior surface. The reactive gas consists exclusively of boron trichloride (BCl). After performing the cleaning process, a material layer over a semiconductor substrate is etched in the chamber.
