18070456. CHAMBER MATCHING BY EQUIPMENT CONSTANT UPDATES simplified abstract (Applied Materials, Inc.)
Contents
- 1 CHAMBER MATCHING BY EQUIPMENT CONSTANT UPDATES
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 CHAMBER MATCHING BY EQUIPMENT CONSTANT UPDATES - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Original Abstract Submitted
CHAMBER MATCHING BY EQUIPMENT CONSTANT UPDATES
Organization Name
Inventor(s)
Sidharth Bhatia of Santa Cruz CA (US)
Roger Lindley of Santa Clara CA (US)
Upendra Ummethala of Cupertino CA (US)
Thomas Li of Santa Clara CA (US)
Michael Howells of San Jose CA (US)
Steven Babayan of Los Altos CA (US)
Mimi-Diemmy Dao of Santa Clara CA (US)
CHAMBER MATCHING BY EQUIPMENT CONSTANT UPDATES - A simplified explanation of the abstract
This abstract first appeared for US patent application 18070456 titled 'CHAMBER MATCHING BY EQUIPMENT CONSTANT UPDATES
Simplified Explanation
The method described in the abstract involves using data indicative of the performance of multiple process chambers to update equipment constants associated with each chamber based on recommendations from a model.
- Data on performance of process chambers is received by a processing device.
- The data is provided to a model for analysis.
- Output from the model includes recommended updates to equipment constants for specific process chambers.
- Equipment constants for each chamber are updated based on the recommendations.
Potential Applications
This technology could be applied in industries such as semiconductor manufacturing, where precise control of process parameters is crucial for product quality and yield.
Problems Solved
This technology helps optimize the performance of process chambers by updating equipment constants based on real-time data and recommendations from a model, leading to improved efficiency and product quality.
Benefits
- Enhanced process control - Increased product yield - Reduced equipment downtime
Potential Commercial Applications
Optimizing equipment constants in process chambers can benefit industries such as semiconductor manufacturing, pharmaceuticals, and chemical processing. A potential commercial application could be in the development of advanced process control systems for these industries.
Possible Prior Art
Prior art in this field may include research on equipment optimization in manufacturing processes, as well as studies on the use of models for predicting equipment performance and recommending updates.
What are the specific types of process chambers mentioned in the abstract?
The abstract mentions a first process chamber and a second process chamber, but it does not specify the exact types of process chambers involved in the method described.
How does the model provide recommendations for updating equipment constants?
The abstract does not provide details on how the model generates recommendations for updating equipment constants based on the data indicative of performance of the process chambers.
Original Abstract Submitted
A method includes receiving, by a processing device, data indicative of performance of a plurality of process chambers. The method further includes providing the data indicative of performance of the plurality of process chambers to a model. The method further includes receiving as output from the model a first recommended equipment constant update associated with a first process chamber of the plurality of process chambers and a second recommended equipment constant update associated with a second process chamber of the plurality of process chambers. The method further includes updating a first equipment constant of the first process chamber and a second equipment constant of the second process chamber in view of the first recommended equipment constant update and the second recommended equipment constant update.
