18070453. ADJUSTING CHAMBER PERFORMANCE BY EQUIPMENT CONSTANT UPDATES simplified abstract (Applied Materials, Inc.)

ADJUSTING CHAMBER PERFORMANCE BY EQUIPMENT CONSTANT UPDATES

Organization Name

Applied Materials, Inc.

Inventor(s)

Sidharth Bhatia of Santa Cruz CA (US)

Roger Lindley of Santa Clara CA (US)

Upendra Ummethala of Cupertino CA (US)

Thomas Li of Santa Clara CA (US)

Michael Howells of San Jose CA (US)

Steven Babayan of Los Altos CA (US)

Mimi-Diemmy Dao of Santa Clara CA (US)

ADJUSTING CHAMBER PERFORMANCE BY EQUIPMENT CONSTANT UPDATES - A simplified explanation of the abstract

This abstract first appeared for US patent application 18070453 titled 'ADJUSTING CHAMBER PERFORMANCE BY EQUIPMENT CONSTANT UPDATES

Simplified Explanation

The method described in the abstract involves analyzing trace data from two processing chambers, one meeting performance metrics and one not meeting them, in order to recommend corrective actions for the underperforming chamber.

• The method involves receiving trace data from two processing chambers, one meeting performance metrics and one not meeting them.
• Target trace data is generated based on the trace data from the well-performing chamber.
• A recommended corrective action is generated for the underperforming chamber based on the target trace data and the trace data from that chamber.
• The recommended corrective action includes updating equipment constants of the underperforming chamber.
• The method then involves performing the recommended corrective action on the underperforming chamber.

Potential Applications

This technology could be applied in semiconductor manufacturing, where optimizing processing chamber performance is crucial for high-quality production.

Problems Solved

This technology helps identify and address performance issues in processing chambers, leading to improved efficiency and product quality in manufacturing processes.

Benefits

The benefits of this technology include increased productivity, reduced downtime, and improved overall quality control in manufacturing operations.

Potential Commercial Applications

One potential commercial application of this technology could be in the semiconductor industry, where optimizing processing chamber performance is essential for producing high-quality semiconductor products.

Possible Prior Art

Prior art in this field may include similar methods for analyzing and optimizing processing chamber performance in various manufacturing industries.

What are the specific performance metrics used to evaluate the processing chambers in this method?

The abstract does not specify the exact performance metrics used to evaluate the processing chambers in this method.

How does the method determine the recommended corrective actions for the underperforming chamber?

The abstract mentions that the recommended corrective actions are generated based on the target trace data and the trace data from the underperforming chamber, but it does not provide details on the specific algorithms or processes used to determine these actions.

Original Abstract Submitted

A method includes receiving, by a processing device, first trace data associated with a first processing chamber, wherein the first processing chamber satisfies one or more performance metrics. The method further includes generating target trace data based on the first trace data associated with the first processing chamber. The method further includes receiving second trace data associated with a second processing chamber, wherein the second processing chamber does not satisfy the one or more performance metrics. The method further includes generating, based on the target trace data and the second trace data, a first recommended corrective action associated with the second processing chamber, wherein the first recommended corrective action includes updating one or more equipment constants of the second processing chamber. The method further includes performing the first recommended corrective action.