18064158. METHOD AND APPARATUS FOR IDENTIFYING POSITIONS OF A SPATIAL LIGHT MODULATOR RELATIVE TO A TEMPLATE EDGE simplified abstract (CANON KABUSHIKI KAISHA)
METHOD AND APPARATUS FOR IDENTIFYING POSITIONS OF A SPATIAL LIGHT MODULATOR RELATIVE TO A TEMPLATE EDGE
Organization Name
Inventor(s)
Mehul N. Patel of Austin TX (US)
METHOD AND APPARATUS FOR IDENTIFYING POSITIONS OF A SPATIAL LIGHT MODULATOR RELATIVE TO A TEMPLATE EDGE - A simplified explanation of the abstract
This abstract first appeared for US patent application 18064158 titled 'METHOD AND APPARATUS FOR IDENTIFYING POSITIONS OF A SPATIAL LIGHT MODULATOR RELATIVE TO A TEMPLATE EDGE
Simplified Explanation: This patent application describes a method for identifying pixels that correspond to the edge of an imprint field, using pixel patterns to predict edge pixels and central pixels within the field.
Key Features and Innovation:
- Method for identifying edge pixels in an imprint field.
- Generation of pixel patterns to predict edge pixels and central pixels.
- Imprinting the test imprint field with a spatially modulated light source.
Potential Applications: This technology could be used in industries such as semiconductor manufacturing, nanotechnology, and precision engineering where precise edge detection is crucial.
Problems Solved:
- Accurate identification of edge pixels in an imprint field.
- Enhancing the precision and efficiency of imprinting processes.
Benefits:
- Improved accuracy in edge detection.
- Enhanced quality and consistency in imprinting processes.
- Potential for increased productivity and cost savings.
Commercial Applications: The technology could be applied in the semiconductor industry for advanced lithography processes, in nanotechnology for precise patterning, and in various other industries requiring high-precision imaging and imprinting techniques.
Prior Art: Readers interested in prior art related to this technology could explore patents and research papers in the fields of lithography, nanotechnology, and image processing.
Frequently Updated Research: Stay updated on the latest advancements in lithography, nanotechnology, and image processing to understand how this technology is evolving in various industries.
Questions about Edge Pixel Identification: 1. What are the potential challenges in accurately identifying edge pixels in an imprint field? 2. How does the use of pixel patterns improve the edge detection process in imprinting technologies?
Original Abstract Submitted
A method for identifying pixels corresponding to an imprint field edge. Generating a set of pixel patterns, each pixel pattern from the set of pixel patterns including edge pixels predicted to be near the imprint field edge of a test imprint field and central pixels corresponding to a center portion of the test imprint field, wherein the edge pixels are turned on, each pixel pattern from the set of pixel patterns having different edge pixels selected and imprinting the test imprint field with a spatially modulated light source that is modulated with at least one pixel pattern from the set of pixel patterns.
