17987591. ULTRAVIOLET AND OZONE CLEANING APPARATUS AND METHOD OF USING simplified abstract (Applied Materials, Inc.)
Contents
- 1 ULTRAVIOLET AND OZONE CLEANING APPARATUS AND METHOD OF USING
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 ULTRAVIOLET AND OZONE CLEANING APPARATUS AND METHOD OF USING - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Original Abstract Submitted
ULTRAVIOLET AND OZONE CLEANING APPARATUS AND METHOD OF USING
Organization Name
Inventor(s)
Khalid Makhamreh of Los Gatos CA (US)
Eliyahu Shlomo Dagan of Sunnyvale CA (US)
ULTRAVIOLET AND OZONE CLEANING APPARATUS AND METHOD OF USING - A simplified explanation of the abstract
This abstract first appeared for US patent application 17987591 titled 'ULTRAVIOLET AND OZONE CLEANING APPARATUS AND METHOD OF USING
Simplified Explanation
The cleaning apparatus described in the patent application utilizes ozonated water and UV electromagnetic radiation to clean a substrate within a cleaning chamber.
- The substrate is contacted with ozonated water and irradiated with UV electromagnetic radiation from a UV lamp within the cleaning chamber.
- Greater than or equal to about 50% of the UV electromagnetic radiation has a wavelength of greater than or equal to about 280 nm.
Potential Applications
The technology can be applied in industries such as semiconductor manufacturing, pharmaceutical production, and medical device manufacturing where cleanliness and sterilization are critical.
Problems Solved
This technology addresses the challenge of effectively cleaning substrates by combining the disinfecting properties of ozonated water with the sterilizing effects of UV radiation.
Benefits
- Enhanced cleaning efficiency - Reduced microbial contamination - Environmentally friendly cleaning process
Potential Commercial Applications
"Advanced Cleaning Technology for Substrates in Manufacturing Processes"
Possible Prior Art
There are existing cleaning methods that use either ozonated water or UV radiation separately, but the combination of both in a single apparatus is a novel approach to substrate cleaning.
What are the safety considerations when using UV radiation for cleaning substrates?
UV radiation can be harmful to human skin and eyes, so proper safety measures such as wearing protective gear and ensuring proper ventilation in the cleaning chamber are essential to prevent exposure.
How does the use of ozonated water contribute to the cleaning process compared to traditional cleaning methods?
Ozonated water has strong oxidizing properties that can effectively kill bacteria and viruses on the substrate surface, providing a more thorough cleaning compared to conventional methods using only water or detergents.
Original Abstract Submitted
A cleaning apparatus for cleaning a substrate wherein the substrate is contacted with ozonated water and irradiating the substrate and the ozonated water with UV electromagnetic radiation from a UV lamp within a cleaning chamber; wherein greater than or equal to about 50% of the UV electromagnetic radiation has a wavelength of greater than or equal to about 280 nm. Methods of cleaning a substrate are also presented.
