17944649. OVER-SCULPTED STORAGE NODE simplified abstract (Micron Technology, Inc.)
Contents
- 1 OVER-SCULPTED STORAGE NODE
OVER-SCULPTED STORAGE NODE
Organization Name
Inventor(s)
Devesh Dadhich Shreeram of Meridian ID (US)
Sanjeev Sapra of Boise ID (US)
Sevim Korkmaz of Boise ID (US)
OVER-SCULPTED STORAGE NODE - A simplified explanation of the abstract
This abstract first appeared for US patent application 17944649 titled 'OVER-SCULPTED STORAGE NODE
Simplified Explanation
The abstract describes a method for creating an over-sculpted storage node by forming an opening in a pattern of materials, etching to over-sculpt the opening, depositing storage node material, and trimming the storage node.
- Opening formed in a pattern of materials
- Etch performed to over-sculpt the opening
- Storage node material deposited in the over-sculpted opening
- Etch performed to remove portions of the pattern of materials
- Etch performed on the storage node material to trim the over-sculpted storage node
Potential Applications
The technology described in this patent application could be applied in the manufacturing of advanced storage devices, such as flash memory or solid-state drives.
Problems Solved
This technology solves the problem of creating intricate and precise storage nodes in a more efficient and controlled manner.
Benefits
The benefits of this technology include improved storage node performance, increased storage capacity, and enhanced reliability of storage devices.
Potential Commercial Applications
The potential commercial applications of this technology could be in the semiconductor industry for the production of high-performance storage devices.
Possible Prior Art
One possible prior art for this technology could be the use of similar etching and deposition processes in the fabrication of semiconductor devices.
What are the specific materials used in the etching and deposition processes described in the patent application?
The specific materials used in the etching and deposition processes are not mentioned in the abstract. Further details would be needed to determine the exact materials involved.
How does the over-sculpting process improve the performance of the storage node?
The over-sculpting process allows for more precise control over the shape and dimensions of the storage node, which can lead to improved performance in terms of speed and reliability.
Original Abstract Submitted
Methods, apparatuses, and systems related to an over-sculpted storage node are described. An example method includes forming an opening in a pattern of materials. The method further includes performing an etch to over-sculpt the opening. The method further includes depositing a storage node material in the over-sculpted opening to form an over-sculpted storage node. The method further includes performing an etch to remove portions of the pattern of materials. The method further includes performing an etch on the storage node material to trim the over-sculpted storage node.
