17908798. SEMICONDUCTOR MANUFACTURING APPARATUS AND CLEANING METHOD OF SEMICONDUCTOR MANUFACTURING APPARATUS simplified abstract (Hitachi High-Tech Corporation)
Contents
SEMICONDUCTOR MANUFACTURING APPARATUS AND CLEANING METHOD OF SEMICONDUCTOR MANUFACTURING APPARATUS
Organization Name
Inventor(s)
SEMICONDUCTOR MANUFACTURING APPARATUS AND CLEANING METHOD OF SEMICONDUCTOR MANUFACTURING APPARATUS - A simplified explanation of the abstract
This abstract first appeared for US patent application 17908798 titled 'SEMICONDUCTOR MANUFACTURING APPARATUS AND CLEANING METHOD OF SEMICONDUCTOR MANUFACTURING APPARATUS
The patent application describes a semiconductor manufacturing apparatus that aims to reduce reaction products or residual HF in a chamber by introducing a processing gas containing vapor of hydrogen fluoride and vapor of alcohol into a processing room.
- The semiconductor manufacturing apparatus includes an inlet for introducing the processing gas, a sample stage for holding the wafer to be processed, and an introduction mechanism for introducing a polar molecular gas to the inlet.
Key Features and Innovation:
- Decreases reaction products or residual HF in a chamber
- Introduces processing gas with vapor of hydrogen fluoride and vapor of alcohol
- Utilizes a sample stage for holding the wafer to be processed
- Introduces a polar molecular gas to the inlet
Potential Applications:
- Semiconductor manufacturing processes
- Chemical processing industries
- Research and development facilities
Problems Solved:
- Reduction of reaction products in a chamber
- Minimization of residual HF
- Enhanced efficiency in semiconductor manufacturing
Benefits:
- Improved process yield
- Reduced contamination risks
- Enhanced safety measures in manufacturing environments
Commercial Applications:
- Semiconductor fabrication facilities
- Chemical processing plants
- Research laboratories
Prior Art: Readers can explore prior patents related to semiconductor manufacturing apparatus, gas introduction mechanisms, and chamber cleaning techniques.
Frequently Updated Research: Stay informed about advancements in semiconductor manufacturing technology, gas handling systems, and contamination control methods.
Questions about Semiconductor Manufacturing Apparatus: 1. How does the introduction of a polar molecular gas help reduce reaction products in the chamber? 2. What are the potential long-term benefits of implementing this semiconductor manufacturing apparatus in industrial settings?
Original Abstract Submitted
An object of the invention is to provide a technique that can decrease a reaction product or residual HF in a chamber. A semiconductor manufacturing apparatus includes an inlet to introduce a processing gas containing vapor of hydrogen fluoride and vapor of alcohol into a processing room in a processing container, a sample stage disposed in the processing room and having an upper surface on which a wafer to be processed is placed, and an introduction mechanism to introduce a polar molecular gas to the inlet.
