17879515. METHOD OF OPERATING SCANNING ELECTRON MICROSCOPE (SEM) AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
Contents
- 1 METHOD OF OPERATING SCANNING ELECTRON MICROSCOPE (SEM) AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 METHOD OF OPERATING SCANNING ELECTRON MICROSCOPE (SEM) AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Abstract
- 1.6 Patent/Innovation Explanation
- 1.7 Potential Applications
- 1.8 Problems Solved
- 1.9 Benefits
- 1.10 Original Abstract Submitted
METHOD OF OPERATING SCANNING ELECTRON MICROSCOPE (SEM) AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME
Organization Name
Inventor(s)
METHOD OF OPERATING SCANNING ELECTRON MICROSCOPE (SEM) AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME - A simplified explanation of the abstract
This abstract first appeared for US patent application 17879515 titled 'METHOD OF OPERATING SCANNING ELECTRON MICROSCOPE (SEM) AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME
Simplified Explanation
Abstract
The abstract describes a scanning electron microscope (SEM) that includes various components such as an electron gun, a deflector, an objective lens, and detectors. It also mentions the use of energy filters to block certain electrons from being detected by the detectors based on their energy levels.
Patent/Innovation Explanation
- The patent describes a scanning electron microscope (SEM) with improved electron detection capabilities.
- It includes an electron gun that generates an electron beam, which is then directed towards a wafer using a deflector.
- The objective lens helps focus the electron beam onto the wafer surface.
- The SEM has two detectors that are designed to detect emission electrons emitted from the wafer when the electron beam is irradiated on it.
- A first energy filter is used to block electrons with energy levels below a certain threshold (first energy) from being detected by the first detector.
- Similarly, a second energy filter is used to block electrons with energy levels below another threshold (second energy) from being detected by the second detector.
Potential Applications
- Semiconductor industry: The SEM can be used for imaging and analyzing semiconductor wafers, helping in the development and quality control of semiconductor devices.
- Material science: The SEM can be utilized to study the microstructure and composition of various materials, aiding in research and development of new materials.
- Biological research: The SEM can be employed to examine biological samples at high resolution, enabling detailed analysis of cellular structures and interactions.
Problems Solved
- Improved electron detection: The use of energy filters allows for more precise detection of emission electrons, filtering out unwanted low-energy electrons.
- Enhanced image quality: By blocking low-energy electrons, the SEM can produce clearer and sharper images, providing better insights into the sample being analyzed.
- Reduction of noise: Filtering out low-energy electrons helps reduce background noise in the detected signals, leading to more accurate and reliable data.
Benefits
- Higher accuracy: The energy filters ensure that only electrons with sufficient energy are detected, improving the accuracy of measurements and analysis.
- Improved image resolution: By eliminating low-energy electrons, the SEM can achieve higher image resolution, enabling finer details to be observed.
- Enhanced data interpretation: The use of energy filters helps researchers focus on relevant electron signals, facilitating better interpretation of the data obtained from the SEM.
Original Abstract Submitted
A scanning electron microscope (SEM) includes an electron gun, a deflector, an objective lens, first and second detectors each configured to detect emission electrons emitted from the wafer based on the input electron beam being irradiated on the wafer, a first energy filter configured to block electrons having energy less than a first energy among emission electrons emitted from a wafer based on an input electron beam from being detected by the first detector, and a second energy filter configured to block electrons having energy less than second energy among the emission electrons from being detected by the second detector.
