17773600. ARRAY SUBSTRATE AND DISPLAY APPARATUS simplified abstract (BOE Technology Group Co., Ltd.)
Contents
- 1 ARRAY SUBSTRATE AND DISPLAY APPARATUS
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 ARRAY SUBSTRATE AND DISPLAY APPARATUS - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Unanswered Questions
- 1.11 Original Abstract Submitted
ARRAY SUBSTRATE AND DISPLAY APPARATUS
Organization Name
BOE Technology Group Co., Ltd.
Inventor(s)
ARRAY SUBSTRATE AND DISPLAY APPARATUS - A simplified explanation of the abstract
This abstract first appeared for US patent application 17773600 titled 'ARRAY SUBSTRATE AND DISPLAY APPARATUS
Simplified Explanation
The patent application describes an array substrate with a planarization layer, an anode material layer, and gas-releasing vias for releasing gas during fabrication.
- An array substrate with a planarization layer
- An anode material layer in a peripheral area
- Gas-releasing vias in the anode material layer
- Vias release gas in the planarization layer
- Different aperture sizes for vias in different regions
Potential Applications
The technology described in the patent application could be applied in the following areas:
- Display panels
- Touchscreen devices
- Solar panels
Problems Solved
The innovation addresses the following issues:
- Gas bubbles during fabrication
- Uneven surfaces on array substrates
- Improved manufacturing processes
Benefits
The technology offers the following benefits:
- Enhanced display quality
- Increased durability
- Improved efficiency in production
Potential Commercial Applications
The technology could be commercially applied in:
- Consumer electronics manufacturing
- Solar panel production
- Display panel fabrication
Possible Prior Art
One possible prior art could be the use of gas-releasing vias in other types of substrates for different applications.
Unanswered Questions
How does the size of the gas-releasing vias impact the fabrication process?
The patent application mentions different aperture sizes for vias in different regions, but it does not elaborate on the specific impact of these sizes on the fabrication process.
Are there any limitations to the use of gas-releasing vias in array substrates?
While the patent application highlights the benefits of gas-releasing vias, it does not discuss any potential limitations or challenges associated with their implementation.
Original Abstract Submitted
An array substrate includes a planarization layer; an anode material layer on the planarization layer and in a peripheral area of the array substrate; and a plurality of gas releasing vias extending through the anode material layer configured to release gas in the planarization layer during a fabrication process. An aperture size of a first respective gas releasing via in a first region is smaller than an aperture size of a second respective gas releasing via in a second region.
