17746811. RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)

RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION

Organization Name

SAMSUNG ELECTRONICS CO., LTD.

Inventor(s)

Ran Namgung of Suwon-si (KR)

Hyeon Park of Suwon-si (KR)

Minsoo Kim of Suwon-si (KR)

Daeseok Song of Suwon-si (KR)

Minki Chon of Suwon-si (KR)

Jun Soo Kim of Hwaseong-si (KR)

Hyun-Woo Kim of Seongnam-si (KR)

Hyun-Ji Song of Anyang-si (KR)

Young Joo Choi of Hwaseong-si (KR)

Suk-Koo Hong of Hwaseong-si (KR)

RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION - A simplified explanation of the abstract

This abstract first appeared for US patent application 17746811 titled 'RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION

Simplified Explanation

The abstract describes a resist topcoat composition for forming patterns on a substrate. The composition includes an acrylic polymer with a hydroxy group and fluorine, a mixture of sulfonic acid and carboxylic acid compounds with fluorine, and a solvent.

• The resist topcoat composition is used to form a protective layer over a patterned substrate.
• The composition includes an acrylic polymer with specific chemical properties.
• It also includes a mixture of sulfonic acid and carboxylic acid compounds in a specific weight ratio.
• The composition is applied using a solvent.
• The method allows for the formation of patterns on the substrate.

Potential Applications

• Semiconductor manufacturing
• Microelectronics fabrication
• Printed circuit board production

Problems Solved

• Provides a protective layer for patterned substrates
• Enhances the performance and durability of the patterns
• Improves the precision and accuracy of pattern formation

Benefits

• Increased resistance to chemicals and environmental factors
• Improved adhesion and compatibility with other materials
• Enhanced pattern definition and resolution

Original Abstract Submitted

A resist topcoat composition includes an acrylic polymer including a structural unit containing a hydroxy group and a fluorine; a mixture including a sulfonic acid compound containing at least one fluorine and a carboxylic acid compound containing at least one fluorine in a weight ratio of about 1:0.1 to about 1:50; and a solvent. A method of forming patterns uses the resist topcoat composition to form a topcoat over a patterned substrate.