Tokyo electron limited (20240339300). Plasma Processing Apparatus simplified abstract
Contents
Plasma Processing Apparatus
Organization Name
Inventor(s)
Kazushi Kaneko of Yamanashi (JP)
Plasma Processing Apparatus - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240339300 titled 'Plasma Processing Apparatus
The abstract describes a plasma processing apparatus with a resonator array structure for plasma excitation.
- The apparatus includes a processing chamber, an electromagnetic wave generator, a dielectric, an electromagnetic wave supply, and a resonator array structure.
- The electromagnetic wave generator produces electromagnetic waves for plasma excitation in the processing space.
- The dielectric faces the processing space and the electromagnetic wave supply delivers the waves through the dielectric.
- The resonator array structure, located on the dielectric's surface, consists of small resonators resonating with magnetic field components of the waves.
- The resonators are smaller than the wavelength of the waves and arranged along the dielectric's surface.
- The electromagnetic wave supply provides magnetic field components perpendicular to the plane of the resonators.
Potential Applications: - Semiconductor manufacturing - Thin film deposition - Surface modification processes
Problems Solved: - Enhanced plasma excitation efficiency - Improved uniformity in plasma processing
Benefits: - Higher quality and precision in processing - Increased productivity and cost-effectiveness
Commercial Applications: Title: Advanced Plasma Processing Apparatus for Semiconductor Manufacturing This technology can revolutionize the semiconductor industry by improving processing efficiency and product quality. It can also find applications in various other industries requiring precise plasma processing.
Prior Art: Researchers can explore patents related to plasma processing apparatus, resonator array structures, and dielectric-based plasma excitation systems for further insights into prior art.
Frequently Updated Research: Researchers are constantly exploring new materials and designs for resonator array structures to enhance plasma excitation efficiency and uniformity.
Questions about Plasma Processing Apparatus with Resonator Array Structure: 1. How does the resonator array structure improve plasma excitation efficiency? 2. What are the key differences between this plasma processing apparatus and traditional systems?
Original Abstract Submitted
a plasma processing apparatus comprises a processing chamber having a processing space, an electromagnetic wave generator configured to generate electromagnetic waves for plasma excitation to be supplied to the processing space, a dielectric having a first surface facing the processing space, an electromagnetic wave supply configured to supply the electromagnetic waves to the processing space via the dielectric, and a resonator array structure disposed along the first surface of the dielectric in the processing chamber. the resonator array structure includes a plurality of resonators resonating with magnetic field components of the electromagnetic waves, having a size smaller than a wavelength of the electromagnetic waves, and arranged in a direction along the first surface of the dielectric. the electromagnetic wave supply is configured to supply magnetic field components perpendicular to a plane on which the plurality of resonators are arranged.
