Tokyo electron limited (20240297020). PLASMA PROCESSING APPARATUS simplified abstract

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PLASMA PROCESSING APPARATUS

Organization Name

tokyo electron limited

Inventor(s)

Taro Ikeda of Nirasaki City (JP)

Yuki Osada of Nirasaki City (JP)

Hiroyuki Miyashita of Nirasaki City (JP)

PLASMA PROCESSING APPARATUS - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240297020 titled 'PLASMA PROCESSING APPARATUS

The abstract describes a plasma processing apparatus with a resonator that resonates electromagnetic waves to be supplied, a slot antenna connected to the resonator, and a transmission window to supply the waves into the processing container.

  • The resonator includes an input port with an inner shaft and an outer cylinder, an output port with a similar configuration, a power supply fin connecting the inner shafts of the input and output ports, and a ground fin connected to the outer cylinders of the input and output ports at the same potential.
  • The power supply fin and ground fin are provided within the resonator to facilitate the transmission of electromagnetic waves.
  • The design of the resonator allows for efficient supply and transmission of electromagnetic waves for plasma processing.
  • The apparatus aims to improve the effectiveness and precision of plasma processing in various applications.
  • The innovative resonator configuration enhances the performance and reliability of the plasma processing apparatus.

Potential Applications: The plasma processing apparatus can be used in semiconductor manufacturing, surface treatment, and material processing industries.

Problems Solved: The technology addresses the need for precise and efficient supply of electromagnetic waves in plasma processing applications.

Benefits: Improved processing efficiency, enhanced precision, and increased reliability in plasma processing operations.

Commercial Applications: Title: Advanced Plasma Processing Apparatus for Semiconductor Manufacturing The technology can be utilized in semiconductor fabrication facilities to enhance the quality and productivity of manufacturing processes.

Questions about Plasma Processing Apparatus: 1. How does the resonator design impact the efficiency of electromagnetic wave transmission? 2. What specific industries can benefit the most from this advanced plasma processing technology?

Frequently Updated Research: Researchers are continuously exploring new materials and processes to further enhance the capabilities of plasma processing apparatus in various industries.


Original Abstract Submitted

a plasma processing apparatus includes: a processing container; a resonator configured to resonate electromagnetic waves to be supplied; a slot antenna connected to the resonator; and a transmission window configured to transmit the electromagnetic waves radiated from the slot antenna and supply the electromagnetic waves into the processing container, wherein the resonator includes: an input port including an inner shaft and an outer cylinder; an output port including an inner shaft and an outer cylinder; a power supply fin connecting the inner shaft of the input port and the inner shaft of the output port and provided in the resonator; and a ground fin connected to the outer cylinder of the input port and the outer cylinder of the output port at a same potential and provided to protrude within the resonator so as to be inserted between fins of the power supply fin.

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